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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Ultrafast relaxation kinetics of photoinjected plasma in III-nitrides
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Ultrafast relaxation kinetics of photoinjected plasma in III-nitrides

机译:III型氮化物中光注入等离子体的超快弛豫动力学

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摘要

The ultrafast relaxation kinetics of photoinjected plasmas in blue-emitting highly-polar III-nitrides is analysed. The evolution of the nonequilibrium thermodynamic state of the 'hot carriers' and 'hot phonons' is studied. It is shown that the dissipative phenomena are orders of magnitude larger than in less strongly polar materials, such as GaAs. Moreover, the phenomena of 'phonon bottleneck' and 'hot-phonon temperature overshoot' are characteristically enhanced.
机译:分析了发射蓝光的高极性III族氮化物中光注入等离子体的超快弛豫动力学。研究了“热载流子”和“热声子”的非平衡热力学状态的演化。结果表明,耗散现象比极性较弱的材料(例如GaAs)大几个数量级。此外,“声子瓶颈”现象和“热声子温度超调”现象在特征上得到了增强。

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