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首页> 外文期刊>Journal of Sol-Gel Science and Technology >Investigation of photocatalytic and low-emissivity properties of TiO2:F films featuring columnar structure prepared on SnO2:F substrate by sol-gel method
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Investigation of photocatalytic and low-emissivity properties of TiO2:F films featuring columnar structure prepared on SnO2:F substrate by sol-gel method

机译：溶胶-凝胶法在SnO2：F基体上制备柱状结构的TiO2：F薄膜的光催化和低发射率性能研究

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Fluorine-doped TiO2 thin films featuring columnar structure were prepared on fluorine-doped tin oxide (SnO2:F) substrate using a sol-gel method. The F doping ratios were varied in the range of 0-8.%. The effect of [F]/[Ti + F] ratio on the structural, morphological, optical, photocatalytic and low-emissivity properties has been investigated in detail. X-ray diffraction studies revealed that all the composited films are mainly composed of anatase TiO2 and rutile SnO2 without other phases. The prepared TiO2:F films possessed the columnar morphology with the single layer thickness ranging from 28 to 31 nm. The best photocatalytic activity was obtained for the films with 4 % F doping ratio which is mainly attributed to the highest crystallization and crystallite size. The transmission and hemispherical emissivity of the composite films could still reach approximately 70 % and 0.20, which match the requirements of the Chinese National Standard (GB/T18915.2-2002), promoting the films for the practical applications.
机译：采用溶胶-凝胶法在掺氟氧化锡（SnO2：F）衬底上制备了具有柱状结构的掺氟TiO2薄膜。 F掺杂率在0-8。％的范围内变化。详细研究了[F] / [Ti + F]比对结构，形态，光学，光催化和低发射率性质的影响。 X射线衍射研究表明，所有复合膜主要由锐钛矿型TiO2和金红石型SnO2组成，没有其他相。制备的TiO2：F薄膜具有柱状形态，单层厚度为28-31nm。 F掺杂率为4％的薄膜获得了最佳的光催化活性，这主要归因于最高的结晶度和微晶尺寸。复合薄膜的透射率和半球形发射率仍可达到约70％和0.20，符合中国国家标准（GB / T18915.2-2002）的要求，促进了薄膜的实际应用。

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