Mechanism for the formation of molecular clusters under ion sputtering

Dzhemilev N.K.

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Mechanism for the formation of molecular clusters under ion sputtering

机译：离子溅射下分子簇的形成机理

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The mechanism for the formation of molecular Si _nO _(2n+1) - clusters above the surface during the recombination of ions, atoms, and molecules independently sputtered in individual cascades is presented. Clusters form when sputtering products Si, O, SiO and SiO _2 (monomers) join the active anion O ~- successively as a result of pair collisions between them. The joining of monomers involves different combinations of them; in this case, the (Si _nO ~(2n+1)) ~- group is formed and consists of monomers with the same masses, but with different monomer compositions in the chain (combinatorial synthesis).

机译：提出了在单独的级联中独立溅射的离子，原子和分子重组期间在表面上方形成分子Si _nO _（2n + 1）-簇的机制。当溅射产物Si，O，SiO和SiO _2（单体）之间由于成对碰撞而依次加入活性阴离子O-时，会形成团簇。单体的连接涉及它们的不同组合。在这种情况下，形成（Si _nO〜（2n + 1））〜-基团，该基团由质量相同但链中单体组成不同的单体组成（组合合成）。

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《Journal of surface investigation: x-ray, synchrotron and neutron techniques》 |2012年第4期|共6页
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Dzhemilev N.K.;
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中图分类原子核物理学、高能物理学;
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1. Mechanism for the formation of molecular clusters under ion sputtering [J] . Dzhemilev N.K. Journal of surface investigation: x-ray, synchrotron and neutron techniques . 2012,第4期

机译：离子溅射下分子簇的形成机理
2. Mechanisms of silicon sputtering and cluster formation explained by atomic level simulations [J] . Peter R. Barry, Patrick Philipp, Tom Wirtz, Journal of mass spectrometry: JMS . 2014,第3期

机译：原子级模拟解释了硅溅射和团簇形成的机理
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Mechanism for the formation of molecular clusters under ion sputtering

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