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首页> 外文期刊>Journal of surface investigation: x-ray, synchrotron and neutron techniques >On a Modified Projection Scheme of the Least-Squares Method for the Modeling of the Distribution of Minority Charge Carriers Generated by an Electron Beam in a Homogeneous Semiconductor Material
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On a Modified Projection Scheme of the Least-Squares Method for the Modeling of the Distribution of Minority Charge Carriers Generated by an Electron Beam in a Homogeneous Semiconductor Material

机译:关于均方半导体材料中电子束产生的少数载流子分布建模的最小二乘方法的修正投影方案

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摘要

A modified projection scheme of the least-squares method is considered for modeling of the distribution of minority charge carriers generated by an electron beam in a homogeneous semiconductor material. The order estimate is given, and the condition for the computational stability of the proposed modified projection scheme is obtained in the form of the limiting relation.
机译:考虑了最小二乘法的改进投影方案,以对由电子束在均质半导体材料中产生的少数载流子的分布进行建模。给出了阶数估计,并以极限关系的形式获得了所提出的改进投影方案的计算稳定性的条件。

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