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首页> 外文期刊>Journal of surface investigation: x-ray, synchrotron and neutron techniques >WO_3 Oxide Film Formation on Tungsten in O_2/H_2 Discharges
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WO_3 Oxide Film Formation on Tungsten in O_2/H_2 Discharges

机译：O_2 / H_2放电在钨上形成WO_3氧化膜

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摘要

The features of tungsten oxidation in a flowing O_2 or O_2/H_2 mixture glow discharge with a hollow cathode are investigated in the cathode, plasma, and afterglow regions at T = 300-350 K. The structure and composition of the samples are analyzed via reflection high-energy electron diffraction, reflection X-ray diffraction, electron probe microanalysis, and X-ray photoelectron spectroscopy. The results of analysis show that the metal surface is covered by a thin film (5-10 nm thick) of amorphous porous hydrated tungsten oxide (WO_3) after its exposure to the discharge and storage in air. The study of the film composition using a timeof-flight mass spectrometer indicates that the WO_3 film contains (WO_3)n (n = 1-6) clusters and water molecules adsorbed in the pores. After exposure of the polycrystals to the O_2/H_2 discharge, the selective intense oxidation of individual grains is detected in the cathode region; the surrounding areas are subjected to weaker oxidation. The thicknesses of the WO_3 films on neighbouring grains differ by more than tenfold. Such grains can be the source of tungsten dust in plasma installations.
机译：在T = 300-350 K的阴极，等离子体和余辉区中研究了带有空心阴极的流动O_2或O_2 / H_2混合物辉光放电中钨的氧化特征。通过反射分析了样品的结构和组成高能电子衍射，反射X射线衍射，电子探针显微分析和X射线光电子能谱。分析结果表明，金属表面暴露于放电并储存在空气中后，被非晶态多孔水合氧化钨（WO_3）的薄膜（5-10 nm厚）覆盖。使用飞行时间质谱仪对薄膜成分进行研究表明，WO_3薄膜包含（WO_3）n（n = 1-6）团簇和吸附在孔中的水分子。在多晶暴露于O_2 / H_2放电后，在阴极区域检测到单个晶粒的选择性强氧化;周围区域的氧化较弱。相邻晶粒上的WO_3膜的厚度相差十倍以上。在等离子装置中，此类晶粒可能是钨尘的来源。

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