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Local Structure of Titanium Nitride-Based Coatings

机译:氮化钛基涂层的局部结构

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摘要

The fine structure of X-ray absorption spectra near the K edge and the extended fine structure of X-ray absorption for titanium, copper, and chromium in nanocrystalline coatings based on titanium nitride doped with copper, chromium, and silicon are experimentally studied. The samples are prepared by the evaporation of composite cathodes using the vacuum arc plasma-assisted method. The parameters of the local environment of titanium, copper, and chromium atoms in the structures of the samples under study are calculated. It is established that the presence of a copper impurity in the coating of no more than 12% in amount leads to a slight increase in the Ti–N distance in comparison with the titanium sample, whereas doping with silicon leads, on the contrary, to a decrease in the bond length. The measurement results for the K absorption edges of copper and chromium confirm that the doping elements are concentrated at the edges of the growing titanium-nitride crystallite and determine its size, which corresponds to the sizes of the coherent-scattering region of 40–50 nm.
机译:实验研究了在K边缘附近的X射线吸收光谱的精细结构,以及基于掺杂有铜,铬和硅的氮化钛的纳米晶涂层中X射线吸收的扩展的精细结构。通过使用真空电弧等离子体辅助方法蒸发复合阴极制备样品。计算了所研究样品的结构中钛,铜和铬原子的局部环境参数。已经确定,与钛样品相比,涂层中铜杂质的含量不超过12%会导致Ti-N距离略有增加,而掺杂硅会导致粘结长度的减少。铜和铬的K吸收边缘的测量结果证实,掺杂元素集中在生长的氮化钛微晶的边缘并确定其尺寸,该尺寸对应于40-50 nm的相干散射区的尺寸。

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