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首页> 外文期刊>Journal of synchrotron radiation >Coherence and wavefront characterization of Si-111 monochromators using double-grating interferometry
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Coherence and wavefront characterization of Si-111 monochromators using double-grating interferometry

机译：Si-111单色仪的双光栅干涉相干和波前表征

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摘要

A study of the coherence and wavefront properties of a pseudo-hannel-cut monochromator in comparison with a double-crystal monochromator is presented. Using a double-grating interferometer designed for the hard X-ray regime, the complex coherence factor was measured and the wavefront distortions at the sample position were analyzed. A transverse coherence length was found in the vertical direction that was a factor of two larger for the channel-cut monochromator owing to its higher mechanical stability. The wavefront distortions after different optical elements in the beam, such as monochromators and mirrors, were also quantified. This work is particularly relevant for coherent diffraction imaging experiments with synchrotron sources.
机译：提出了与双晶体单色仪相比，伪通道切割单色仪的相干性和波前特性的研究。使用为硬X射线设计的双光栅干涉仪，测量了复相干因子，并分析了样品位置的波前畸变。在垂直方向上发现横向相干长度，由于其较高的机械稳定性，对于通道切割单色仪而言，横向相干长度大两倍。还对光束中不同光学元件（例如单色仪和反射镜）后的波前畸变进行了量化。这项工作与同步辐射源的相干衍射成像实验特别相关。

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