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首页> 外文期刊>Journal Of The South African Institute Of Mining & Metallurgy >Glow discharge optical emission spectroscopy: a general overview with regard to nuclear materials
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Glow discharge optical emission spectroscopy: a general overview with regard to nuclear materials

机译：辉光放电光发射光谱：关于核材料的概述

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Glow discharge optical emission spectroscopy (GD-OES) is an analytical technique used in the analysis of solid, conducting materials. Though primarily of interest as a depth profiling technique on samples with varying layers of both conducting and non-conducting materials, it is also capable of rapid bulk analysis of homogenous, solid samples. GD-OES combines the advantages of ICP-OES (wide detection range, speed, and lack of interferences) with the solid sampling of XRF techniques. This allows the analyst to not only quantify the elemental composition of a sample, but to evaluate it in terms of homogeneity with depth, a field in which auger electron spectroscopy (AES) and secondary ion mass spectrometry (SIMS) have traditionally been the primary techniques. Although GD-OES does not replace these useful techniques, it does offer various advantages over them, making it an excellent complementary analytical tool.In GD-OES analysis, a low-pressure glow discharge plasma is generated with the sample material acting as a cathode, accelerating the cations in the plasma towards the sample surface. This bombardment causes the sample material to 'sputter', essentially knocking free atoms or molecules of analyte material, which are then drawn into the plasma where they are excited. The light emitted by this excitation is then diffracted to separate the wavelengths emitted by the specific elements and detected by a spectrophotometer. The intensity of the signal is directly proportional to the quantity of analyte element present in the sample, allowing simple calibration and quantitative determination of the elements.Technological improvements made in the past twenty years or so have significantly increased the usefulness of GD-OES for surface analysis. Faster plasma stabilization and start-up allow for the quantification of surface layers as thin as 1 nm. Sputter rates have been accurately measured for many common materials, allowing them to be built into software libraries in the instrument's control software. This dramatically expands the usefulness of this software and the ease of performing analyses.GD-OES analysis of nuclear materials allows for the rapid determination of the elemental composition without the requirement of initial dissolution. The thickness of any corrosion layers on nuclear materials can also be determined.
机译：辉光放电光发射光谱法（GD-OES）是用于分析固体导电材料的一种分析技术。尽管作为具有不同导电和非导电材料层的样品的深度剖析技术而引起人们的广泛关注，但它也能够对均匀的固体样品进行快速批量分析。 GD-OES结合了ICP-OES的优势（宽检测范围，速度和无干扰）以及XRF技术的固体采样。这使分析人员不仅可以量化样品的元素组成，还可以根据深度的均一性对其进行评估，而在这一领域，传统上主要采用螺旋电子能谱（AES）和二次离子质谱（SIMS）技术。尽管GD-OES不能替代这些有用的技术，但它确实提供了多种优势，使其成为出色的辅助分析工具。在GD-OES分析中，以样品材料为阴极生成了低压辉光放电等离子体，使血浆中的阳离子朝着样品表面加速。这种轰击会导致样品材料“溅射”，基本上敲碎了分析物材料的自由原子或分子，然后将其吸入等离子体中并在其中被激发。然后，由该激发发射的光被衍射以分离特定元素发射并由分光光度计检测到的波长。信号的强度与样品中存在的分析物元素的数量成正比，从而可以简单地进行元素的校准和定量测定。在过去的二十多年中，技术的进步显着提高了GD-OES在表面处理中的实用性。分析。更快的等离子体稳定度和启动速度可量化薄至1 nm的表面层。已经对许多常用材料的溅射速率进行了精确测量，从而可以将其内置到仪器控制软件的软件库中。这极大地扩展了该软件的实用性和执行分析的便利性。核材料的GD-OES分析可快速确定元素组成，而无需初始溶解。也可以确定核材料上任何腐蚀层的厚度。

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