Fabrication of Poly-Si Thin Film on Glass Substrate by Aluminum-induced Crystallization]

XU Man; XIA Donglin; YANG Sheng

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Fabrication of Poly-Si Thin Film on Glass Substrate by Aluminum-induced Crystallization]

机译：铝诱导结晶在玻璃基板上制备多晶硅薄膜

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Amorphous silicon {a-Si) thin films were deposited on glass substrate by PECVD, and poly-crystalline silicon (poly- Si) thin films were prepared by aluminum- induced crystallization (AIC) . The effects of annealing temperature on live microstructure and morphology were investigated. The AIC poly-Si thin films were characterized by XRD, Raman and SEM. It is found that a-Si thin film has a amorphous structure after annealing at 400 deg C for 20 min , a-Si films begin to crystallize after annealing at 450 deg C for 20 min, and tlie crystal-Unity of a- Si thin films is enhanced obviously with the increment of annealing temperature .

机译：通过PECVD在玻璃基板上沉积非晶硅（a-Si）薄膜，并通过铝诱导结晶（AIC）制备多晶硅（poly-Si）薄膜。研究了退火温度对活组织和形态的影响。用XRD，拉曼和SEM对AIC多晶硅薄膜进行了表征。发现a-Si薄膜在400℃退火20min后具有非晶态结构，a-Si膜在450℃退火20min后开始结晶，并且晶体均匀。随着退火温度的升高，薄膜明显增强。

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《Journal of Wuhan University of Technology. Materials Science edition》 |2006年第2期|共4页
作者
XU Man; XIA Donglin; YANG Sheng;
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正文语种 eng
中图分类一般工业技术;
关键词
aluminum- induced crystallization; polycrystalline silicon thin film; arnorplous silicon thin film; solar cells;

机译：铝诱导结晶;多晶硅薄膜;单晶硅薄膜;太阳能电池;

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1. Fabrication of Poly-Si Thin Film on Glass Substrate by Aluminum-induced Crystallization] [J] . XU Man, XIA Donglin, YANG Sheng Journal of Wuhan University of Technology. Materials Science edition . 2006,第2期

机译：铝诱导结晶在玻璃基板上制备多晶硅薄膜
2. The metal-induced crystallization of poly-Si and the mobility enhancement of thin film transistors fabricated on a glass substrate [J] . Thanh Nga Nguyen, Van Duy Nguyen, Sungwook Jung, Microelectronic Engineering . 2010,第11期

机译：金属诱导的多晶硅结晶和在玻璃基板上制造的薄膜晶体管的迁移率增强
3. Fabrication of uniform poly-Si thin film on glass substrate by AIC [J] . Atsutoshi Doi Thin Solid Films . 2004,第Mar期

机译：AIC在玻璃基板上制备均匀的多晶硅薄膜
4. In-Situ Aluminum-Induced Crystallization of Si Thin-Films on Glass Substrates above the Eutectic Temperature using HW-CVD [C] . Ozgenc Ebil, Roger Aparicio, Robert Birkmire Symposium Proceedings vol.808; Symposium on Amorphous and Nanocrystalline Silicon Science and Technology - 2004; 20040413-16; San Francisco,CA(US) . 2004

机译：使用HW-CVD在共晶温度以上在玻璃基板上原位铝诱导的Si薄膜结晶
5. Deposition and characterization of silicon thin-films by aluminum-induced crystallization. [D] . Ebil, Ozgenc. 2005

机译：铝诱导结晶沉积和表征硅薄膜。
6. Fabrication of Single Crystal Gallium Phosphide Thin Films on Glass [O] . Hal Emmer, Christopher T. Chen, Rebecca Saive, -1

机译：在玻璃上制备单晶磷化镓薄膜
7. Formation of Poly-Si Films on Glass Substrates by Using Microwave Plasma Heating and Fabrication of TFT’s on the Films [O] . Hiroki Nakaie, Tetsuji Arai, Keisuke Arimoto, 2018

机译：通过使用微波等离子体加热和TFT在薄膜上制造的玻璃基板上的聚-Si薄膜形成

Fabrication of Poly-Si Thin Film on Glass Substrate by Aluminum-induced Crystallization]

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