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首页> 外文期刊>Journal of Ceramic Processing Research. (Text in English) >Optical properties of surface-tunable NiO films depending on oxygen pressure, growth temperature, and growth duration
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Optical properties of surface-tunable NiO films depending on oxygen pressure, growth temperature, and growth duration

机译：表面可调NiO薄膜的光学性质取决于氧气压力，生长温度和生长持续时间

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摘要

Nanostructures based on thin oxide films have a number of applications. In this work, we report the physical and optical properties of a wide range of NiO thin film nanostructures. These films were fabricated using thermal oxidation of a Ni substrate with different oxygen partial pressures, growth temperatures, and growth durations. SEM observations of NiO films evaporated in static air to 200 sccm O-2 partial pressure conditions show the evolution of the microstructure from initially coarse islands or particles to well-formed NiO thin films combined with neighboring structures. The root-mean-square crystallite sizes from AFM measurements were 50.769 nm and 137.66 nm for temperatures of 620 degrees C and 730 degrees C and durations of 4 and 6 h, respectively. X-ray diffraction was performed to understand the microstructure of the two-dimensional NiO thin films in more detail. Photoluminescence (PL) spectra of the NiO films reveal that the both the PL intensity and energy vary with respect to oxygen pressure, temperature, and duration. The mechanisms for the different observed microstructures and the optical transitions in the NiO thin films are considered.
机译：基于薄氧化膜的纳米结构具有许多应用。在这项工作中，我们报告了各种NiO薄膜纳米结构的物理和光学性质。这些膜是使用具有不同氧分压，生长温度和生长持续时间的Ni基板热氧化制备的。在静态空气中蒸发到200 sccm O-2分压条件下的NiO膜的SEM观察表明，微观结构从最初的粗大岛或颗粒演变为结合相邻结构的形态良好的NiO薄膜。在620摄氏度和730摄氏度的温度下，持续时间分别为4小时和6小时，通过AFM测量得出的均方根微晶尺寸分别为50.769 nm和137.66 nm。进行X射线衍射以更详细地了解二维NiO薄膜的微观结构。 NiO薄膜的光致发光（PL）光谱表明，PL强度和能量均随氧气压力，温度和持续时间而变化。考虑了在NiO薄膜中观察到的不同微观结构和光学跃迁的机理。

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