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首页> 外文期刊>Журнал аналитической химии >Inductively coupled plasma atomic emission determination of impurities in high-purity niobium and tantalum oxides after separation of the matrix on a Polyorgs VII sorbent
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Inductively coupled plasma atomic emission determination of impurities in high-purity niobium and tantalum oxides after separation of the matrix on a Polyorgs VII sorbent

机译:在Polyorgs VII吸附剂上分离基质后,电感耦合等离子体原子发射光谱法测定高纯度铌和钽氧化物中的杂质

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摘要

Two methods were suggested for determining impurities in niobium and tantalum matrices: determination by inductively coupled plasma atomic emission spectrometry (ICP-AES) without preconcentration and determination alter sorption separation of the matrix. Spectral interferences in the ICP-AES determination of impurities m the above matrices were examined. Interelement correction factors were calculated, and sorption behavior of niobium, tantalum, and some other elements on a Polyorgs VII sorbent was studied. From this study, conditions for sorption separation of the matrices were chosen. In addition, procedures for the ICP-AES determination of impurities in high-purity niobium and tantalum oxides were developed (the determination limits are n X 10-0.n #mu#g/g).
机译:提出了两种测定铌和钽基质中杂质的方法:通过电感耦合等离子体原子发射光谱法(ICP-AES)进行测定而不进行预浓缩,以及测定改变基质的吸附分离度的方法。检查了上述基质中ICP-AES中杂质的光谱干扰。计算了元素校正因子,并研究了铌,钽和其他一些元素在Polyorgs VII吸附剂上的吸附行为。从这项研究中,选择了吸附分离基质的条件。另外,开发了ICP-AES测定高纯铌和钽氧化物中杂质的方法(测定极限为n X 10-0.n#mu#g / g)。

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