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首页> 外文期刊>日本磁気学会学術講演概要集 >Directed Self-Assembly Lithography for 5 Tbit/inch~2 Bit-patterned Media
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Directed Self-Assembly Lithography for 5 Tbit/inch~2 Bit-patterned Media

机译：5 Tbit / inch〜2位图案化介质的定向自组装光刻

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摘要

Bit patterned media (BPM) is a strong candidate for high-density magnetic recording media. Self-assembled dib lock copolymer is a promising material of an etching mask for fabricating high-density BPM. We have fabricated 2.5 Tbit/inch~2 CoPt BPM with data tracks and servo patterns by using the directed self-assembled mask. For the case of 5.0 Tbit/inch~2 BPM, development of finer self-assembled mask as well as thermally stable magnetic dots is necessary. The bit pitch of data track area is 12 nm for 5.0 Tb/inch~2. The magnetic recording medium should also have servo patterns for addressing a recording head. Directed self-assembly (DSA) is a solution for this requirement. In this paper, we have developed 12 nm-pitch dib lock copolymer mask in both data track and servo pattern areas. FePt material was used for the magnetic dots for thermally stable dots with less than 6nm diameter.
机译：位图样介质（BPM）是高密度磁记录介质的理想选择。自组装的迪布锁共聚物是用于制造高密度BPM的蚀刻掩模的有前途的材料。通过使用定向自组装掩模，我们制造了具有数据磁道和伺服模式的2.5 Tbit / inch〜2 CoPt BPM。对于5.0 Tbit / inch〜2 BPM的情况，必须开发更精细的自组装掩模以及热稳定的磁点。对于5.0 Tb / inch〜2，数据磁道区域的位间距为12 nm。磁记录介质还应具有用于寻址记录头的伺服模式。定向自组装（DSA）是满足此要求的解决方案。在本文中，我们已经在数据磁道和伺服图案区域开发了12 nm间距的Dib Lock共聚物掩模。 FePt材料用作直径小于6nm的热稳定点的磁性点。

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