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首页> 外文期刊>日本応用磁気学会誌 >Investigation of fabrication process for writing-head cores using electroless CoFeB plating
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Investigation of fabrication process for writing-head cores using electroless CoFeB plating

机译：化学镀CoFeB镀写头磁芯的工艺研究

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摘要

Preparation of writing-head cores by the electrolessplating method was investigated. Electroless CoFeB plating haspoor selectivity of deposition onto a patterned surface; that is, filmdeposition occurred not only on the catalytic surface but also onthe photoresist, which had no catalyst. To improve the selectivityof electroless CoFeB plating, the effects of agitation and additiveswere investigated. Deposition onto the photoresist was decreasedby agitation, but was still observed. Some organic additives werefound to inhibit deposition onto the photoresist, and CoFeBplating from a bath including that additive had good selectivity. Bycombining of these two methods, it may be possible to obtaincoherent deposition onto the patterned surface of a writing-head core.
机译：研究了通过化学镀方法制备记录头芯的方法。化学式CoFeB电镀的图案化表面沉积选择性差;也就是说，膜沉积不仅发生在催化表面上，而且发生在没有催化剂的光刻胶上。为了提高化学镀CoFeB的选择性，研究了搅拌和添加剂的影响。通过搅拌减少在光致抗蚀剂上的沉积，但是仍然观察到。发现一些有机添加剂可抑制沉积到光致抗蚀剂上，并且从包含该添加剂的浴中进行的CoFeB电镀具有良好的选择性。通过这两种方法的组合，可以在书写头芯的图案化表面上获得相干沉积。

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