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首页> 外文期刊>Chemistry: A European journal >Covalent Modification of Graphene Oxide with Carbazole Groups for Laser Protection
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Covalent Modification of Graphene Oxide with Carbazole Groups for Laser Protection

机译：氧化石墨烯与咔唑基团的共价修饰用于激光保护

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摘要

In the past decades, significant effort has been invested into the research and development of optical limiting materials and processes in order to develop practical solutions for the protection from laser beams. In this study, a new soluble graphene oxide based material (GO-Cz) has been synthesized through the covalent modification of graphene oxide (GO) with a carbazole derivative (Cz). The formation of an amido bond between the Cz group and GO has been confirmed by X-ray photoelectron and Fourier transform infrared spectroscopy. At the same concentration, both the nonlinear extinction coefficient and the imaginary third-order susceptibility were increased by a factor of approximate to 6.93 at 532nm and approximate to 6.07 at 1064nm relative to those of GO, as a result of the covalent grafting of the Cz moieties onto the GO surface. The GO-Cz dispersions exhibit a much better optical limiting performance than GO and GO/Cz blends at both 532 and 1064nm due to the possible intramolecular electron-transfer between the GO and Cz moieties and the effective combination of the different nonlinear optical mechanisms.
机译：在过去的几十年中，为了开发实用的解决方案以保护免受激光束的侵害，已经在光学限制材料和工艺的研究和开发上投入了大量的精力。在这项研究中，通过对氧化石墨烯（GO）与咔唑衍生物（Cz）进行共价修饰，合成了一种新的可溶性氧化石墨烯基材料（GO-Cz）。 X射线光电子和傅立叶变换红外光谱已经证实了Cz基团和GO之间酰胺键的形成。在相同的浓度下，由于Cz的共价接枝，非线性消光系数和虚构的三阶磁化率相对于GO在532nm处增加了约6.93，在1064nm处则增加了约6.07，达到了0.02。部分进入GO表面。由于GO和Cz部分之间可能存在分子内电子转移以及不同非线性光学机制的有效结合，GO-Cz分散体在532和1064nm处均比GO和GO / Cz共混物具有更好的光学限制性能。

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