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Decomposition of Fluorinated Graphene under Heat Treatment

机译：热处理条件下氟化石墨烯的分解

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摘要

Fluorination modifies the electronic properties of graphene, and thus it can be used to provide material with on-demand properties. However, the thermal stability of fluorinated graphene is crucial for any application in electronic devices. Herein, X-ray photoelectron spectroscopy (XPS), temperature-programmed desorption (TPD), and Raman spectroscopy were used to address the impact of the thermal treatment on fluorinated graphene. The annealing, at up to 700 K, caused gradual loss of fluorine and carbon, as was demonstrated by XPS. This loss was associated with broad desorption of CO and HF species, as monitored by TPD. The minor single desorption peak of CF species at 670 K is suggested to rationalize defect formation in the fluorinated graphene layer during the heating. However, fluorine removal from graphene was not complete, as some fraction of strongly bonded fluorine can persist despite heating to 1000 K. The role of intercalated H2O and OH species in the defluorination process is emphasised.
机译：氟化修饰了石墨烯的电子性质，因此可以用来提供具有按需性质的材料。但是，氟化石墨烯的热稳定性对于电子设备中的任何应用至关重要。在此，使用X射线光电子能谱（XPS），程序升温解吸（TPD）和拉曼光谱来解决热处理对氟化石墨烯的影响。 XPS证明，最高700 K的退火会导致氟和碳逐渐损失。如TPD所监测，这种损失与CO和HF种类的广泛解吸有关。建议CF物质在670 K处出现较小的单个解吸峰，以使加热过程中氟化石墨烯层中的缺陷形成合理化。但是，从石墨烯中除去氟的过程还不完全，因为尽管加热到1000 K，仍有一部分牢固结合的氟会保留下来。强调了插入的H2O和OH在脱氟过程中的作用。

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