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首页> 外文期刊>Chemical Physics Letters >Nanoscale investigation on nature of dark hole in moisture-exposed tris(8-hydroxyquinoline) aluminum thin films
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Nanoscale investigation on nature of dark hole in moisture-exposed tris(8-hydroxyquinoline) aluminum thin films

机译:暴露于水分的三(8-羟基喹啉)铝薄膜中黑洞性质的纳米尺度研究

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摘要

The morphological evolution and nature of the degradation of the moisture-exposed tris(8-hydroxyquinoline) aluminum (Alq(3)) thin films have been microscopically investigated by variable-temperature tapping mode atomic force microscopy and complementarily by thickness-shear mode acoustic wave sensor. It is plausibly ascertained that the dark hole in the Alq(3) films results from the release of the volatile 8-hydroxyquinoline, a product of the reaction of Alq(3) with moisture. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 20]
机译:湿式暴露的三(8-羟基喹啉)铝(Alq(3))薄膜的形貌演化和降解性质已通过变温敲击模式原子力显微镜和厚度剪切模式声波进行了显微镜研究传感器。可以确定的是,Alq(3)膜中的黑洞是由挥发性8-羟基喹啉的释放引起的,该挥发物是Alq(3)与水分反应的产物。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:20]

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