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首页> 外文期刊>ACS applied materials & interfaces >Creating Self-Organized Submicrometer Contact Instability Patterns In Soft Elastic Bilayers with a Topographically Patterned Stamp
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Creating Self-Organized Submicrometer Contact Instability Patterns In Soft Elastic Bilayers with a Topographically Patterned Stamp

机译：在带有地形图案化印记的软弹性双层膜中创建自组织的亚微米接触不稳定性模式

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摘要

The surface of a thin elastic bilayer becomes spontaneously unstable when it is brought in proximity to another rigid contactor. The instability patterns, which are random and isotropic, exhibit a dominant lateral length scale of instability X, which linearly scales with the bilayer thickness (h) as: λ = R_Fh. It is known that for an elastic bilayer, Rp exhibits a nonlinear dependence on the ratios of individual film thicknesses (H) and shear moduli (M) of the two constituent layers, and can have values as low as 0.5 under specific conditions. This is in contrast to a near constant value of R_F ≈ 3 for a single layer elastic film. These isotropic contact instability patterns in a bilayer can be ordered, aligned and modulated using a topographically patterned stamp. The precise morphology of the aligned structures depends on commensuration between A and the stamp periodicity (λ_p), and on the intersurface separation distance. A variety of patterns, like an array of circular holes, double periodic channels, etc., in addition to a positive and a negative replica of the stamp pattern, can be engineered with a simple stamp having 1D grating structure. A lower value of R_F in a bilayer allows generating patterns with sub 500 nm lateral resolution, which is impossible to create by elastic contact lithography (ECL) of a single layer film due to strong surface tension effects in ultrathin films. Thus, control of elastic instability in a bilayer with a patterned stamp represents a flexible soft lithography tool allowing modulation of length scales, morphology, and order.
机译：当薄的弹性双层表面靠近另一个刚性接触器时，其表面会自然地变得不稳定。随机模式和各向同性模式的不稳定性表现出主要的横向不稳定性X尺度，该尺度随双层厚度（h）线性成比例：λ= R_Fh。已知对于弹性双层，Rp对两个组成层的各个膜厚度（H）和剪切模量（M）之比表现出非线性依赖性，并且在特定条件下可具有低至0.5的值。这与单层弹性膜的R_F≈3的近似恒定值相反。双层中的这些各向同性接触不稳定性图形可以使用地形图压模进行排序，对齐和调制。对齐结构的精确形态取决于A与压模周期（λ_p）之间的比重，以及表面间的距离。除了印模图案的正和负复制品以外，还可以利用具有一维光栅结构的简单印模来设计各种图案，例如圆孔阵列，双周期通道等。双层中较低的R_F值允许生成横向分辨率低于500 nm的图案，由于超薄膜中的强大表面张力效应，单层薄膜的弹性接触光刻（ECL）无法创建这种图案。因此，用图案化的压模控制双层中的弹性不稳定性代表了一种灵活的软光刻工具，可以调节长度比例，形态和顺序。

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