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首页> 外文期刊>ACS applied materials & interfaces >Intrinsic Charge Trapping Observed as Surface Potential Variations in diF-TES-ADT Films
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Intrinsic Charge Trapping Observed as Surface Potential Variations in diF-TES-ADT Films

机译:固有电荷俘获被观察为diF-TES-ADT膜中的表面电势变化

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摘要

Spatial variations in surface potential are measured with Kelvin probe force microscopy for thin films of 2,8-difluoro-5,11-bis(triethylsilylethynyl)anthradithiophenes (diF-TES-ADT) grown on SiO2 and silane-treated SiO2 substrates by organic molecular beam deposition. The variations are observed both between and within grains of the polycrystalline organic film and are quantitatively different than electrostatic variations on the substrate surfaces. The skewness of surface potential distributions is larger on SiO2 than on HMDS-treated substrates. This observation is attributed to the impact of substrate functionalization on minimizing intrinsic crystallographic defects in the organic film that can trap charge.
机译:用开尔文探针力显微镜测量通过有机分子在SiO2和硅烷处理的SiO2衬底上生长的2,8-二氟-5,11-双(三乙基甲硅烷基乙炔基)噻吩基噻吩(diF-TES-ADT)薄膜的表面电势的空间变化束沉积。在多晶有机膜的晶粒之间和之内都观察到这种变化,并且该变化与基板表面上的静电变化在数量上不同。 SiO2上的表面电势分布的偏斜度大于HMDS处理过的基板。该观察结果归因于基板功能化对最小化可捕获电荷的有机膜中固有晶体缺陷的影响。

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