...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>ACS applied materials & interfaces >Influence of Environmental Humidity on the Wear and Friction of a Silica/Silicon Tribopair Lubricated with a Hydrophilic Ionic Liquid
【24h】

Influence of Environmental Humidity on the Wear and Friction of a Silica/Silicon Tribopair Lubricated with a Hydrophilic Ionic Liquid

机译：环境湿度对用亲水性离子液体润滑的二氧化硅/硅摩擦学对的磨损和摩擦的影响

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

In this study, the tribological behavior of silica/silicon surfaces lubricated with the ionic liquid 1-ethyl-3-methylimidazolium ethylsulfate ([EMIM] EtSO4) was investigated. Tests were carried out in the presence of either humid air (45-55% relative humidity) or in a nitrogen atmosphere, and the results were compared with those obtained using pure water as a lubricant. The cross-sectional analysis of the contact area performed by focused-ion-beam scanning electron microscopy indicated the presence of cracks in the subsurface region, showing that brittle fracture contributed to wear. Sliding promoted the formation of a third body, the presence of which was indicated by optical and secondary electron microscopy. X-ray photoelectron spectroscopy showed that the third body was mostly composed of silicon oxides. The accumulation of the debris was controlled by the presence of water: in the presence of a nitrogen atmosphere, particles were trapped between the sliding surfaces, whereas in the case of humid air, the debris was progressively removed from the contact. Notably, the presence of trapped particles was associated with higher values of wear coefficients of both disks and pins. In addition, a lower roughness was observed along the direction of sliding in the case of water-containing ionic liquid. The observed trends in wear and the combined results of the various techniques, as well as the comparison with tests carried out in the presence of pure water, all point to the characteristic tribochemical reactions of water with silicon-based materials, namely, the formation of a sacrificial layer of hydrated oxide and the dissociative adsorption of water at crack tips of SiO2. In the absence of water, the lack of a tribochemical mechanism forming a sacrificial layer leads to a microfracture,dominated wear mechanism over the entire duration of the test, thus leading to more severe wear. The possible occurrence of stress-induced phase transformation of silicon during sliding is also discussed.
机译：在这项研究中，研究了使用离子液体1-乙基-3-甲基咪唑乙基硫酸乙酯（[EMIM] EtSO4）润滑的二氧化硅/硅表面的摩擦学行为。在潮湿空气（相对湿度为45-55％）或氮气环境下进行测试，并将结果与​​使用纯水作为润滑剂的结果进行比较。通过聚焦离子束扫描电子显微镜对接触区域进行的横截面分析表明，在地下区域存在裂纹，表明脆性断裂是造成磨损的原因。滑动促进了第三体的形成，光学和二次电子显微镜表明存在第三体。 X射线光电子能谱显示第三体主要由氧化硅组成。杂物的堆积是通过水的存在来控制的：在氮气氛下，颗粒被捕获在滑动表面之间，而在潮湿空气的情况下，杂物逐渐从接触中去除。值得注意的是，被捕获的颗粒的存在与磁盘和销钉的较高磨损系数值相关。另外，在含水离子液体的情况下，沿着滑动方向观察到较低的粗糙度。观察到的磨损趋势和各种技术的综合结果，以及与在纯水存在下进行的测试的比较，均表明水与硅基材料发生了摩擦化学反应，即形成了水。水合氧化物的牺牲层和水在SiO2裂纹尖端的离解吸附。在没有水的情况下，缺乏形成牺牲层的摩擦化学机制会导致在整个测试过程中以微裂纹为主的磨损机制，从而导致更严重的磨损。还讨论了在滑动过程中硅可能引起的应力相变。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号