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首页> 外文期刊>Applied optics >Postfluorination of fluoride films for vacuum-ultraviolet lithography to improve their optical properties
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Postfluorination of fluoride films for vacuum-ultraviolet lithography to improve their optical properties

机译：氟化物膜的后氟化，用于真空紫外光刻，以改善其光学性能

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Transmittance of fluoride films prepared by various kinds of deposition methods is not sufficient for a vacuum-ultraviolet (VUV) stepper application. Moreover, moisture penetrates into fluoride films because of porous structures. Then the moisture reacts with the fluoride chemically, and the photoabsorption of the films increases with elapsed time. Postfluorination treatment, in which F-poor areas of fluoride films are sufficiently fluorinated and the film structures are modified to be denser, has been developed. The postfluorination treatment was performed at 0.1 MPa of diluted F_(2) gas in a special apparatus made of nickel. This treatment reduces photoabsorption of fluoride films and prevents photoabsorption from increasing again with elapsed time. In a long-time F_(2) laser irradiation test, the transmittance of asdeposited fluoride films remarkably degraded with irradiation. On the other hand, there is no tendency of transmittance degradation in the case of postfluorinated fluoride films. The postfluorination is able to improve the optical performance of fluoride films, promising the highest coating level for VUV lithography.
机译：通过各种沉积方法制备的氟化物膜的透射率不足以用于真空紫外（VUV）步进器应用。此外，由于多孔结构，水分渗透到氟化物膜中。然后，水分与氟化物发生化学反应，并且随着时间的流逝，薄膜的光吸收增加。已经开发出后氟化处理，其中氟化物膜的F-贫乏区域被充分氟化并且膜结构被改性为更致密。在由镍制成的特殊设备中，在0.1 MPa的稀释F_（2）气体下进行后氟化处理。该处理减少了氟化物膜的光吸收并且防止了光吸收随着时间的流逝再次增加。在长时间的F_（2）激光辐照试验中，沉积的氟化物膜的透射率随辐照而显着降低。另一方面，在后氟化氟化物膜的情况下，没有透射率降低的趋势。后氟化能够改善氟化物薄膜的光学性能，有望实现VUV光刻的最高涂层水平。

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