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Determination of thermal conductivity of thin layers used as transparent contacts and antireflection coatings with a photothermal method

机译:用光热法测定用作透明触点和减反射涂层的薄层的热导率

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A photothermal experiment with mirage detection was used to determine the thermal conductivity of various thin films deposited on semiconductor substrates. The first type consisted of conducting oxide films: ZnO and CdO deposited on GaSb:Te, while the other contained high dielectric constant HfO_(2) layers on Si. All films were fabricated using a magnetron sputtering technique. Experimental results showed that the value of the thermal conductivity of ZnO and CdO films is lower than the value obtained for HfO_(2). Thermal conductivities of investigated thin films are about 2 orders of magnitude lower than those corresponding to bulk materials.
机译:使用带有幻影检测的光热实验来确定沉积在半导体衬底上的各种薄膜的热导率。第一种由导电氧化膜组成:沉积在GaSb:Te上的ZnO和CdO,而另一种则包含在Si上的高介电常数HfO_(2)层。所有膜均使用磁控溅射技术制造。实验结果表明,ZnO和CdO薄膜的热导率值低于HfO_(2)的值。被研究的薄膜的热导率比对应于块状材料的热导率低约2个数量级。

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