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首页> 外文期刊>Applied optics >Fast computation of constructive and destructive interference areas in partially coherent imaging for resolution enhancement in optical microlithography
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Fast computation of constructive and destructive interference areas in partially coherent imaging for resolution enhancement in optical microlithography

机译：快速计算部分相干成像中的相长和相消干涉区域，以提高光学微光刻的分辨率

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摘要

We present a method to determine constructive and destructive interference areas on the object plane in partially coherent imaging. This method is based on the interference pattern on the image plane. A function GAMMA that shows constructive and destructive interference areas with respect to the origin on the object plane is derived as the product of mutual intensity on the object plane and the Fourier transform of the pupil function. The convolution integral of GAMMA and object transmittance gives the constructive and destructive interference areas. Experimental results show that small clear openings placed at constructive interference areas enhance light intensity at desired positions. By applying this method to optical microlithography imaging, one can achieve resolution enhancement of fine features with a relatively small amount of computation.
机译：我们提出一种在部分相干成像中确定物平面上相长和相消区域的方法。该方法基于像面上的干涉图样。表示相对于物平面上原点的相长和相消干涉区域的函数GAMMA是物平面上相互强度与瞳孔函数的傅立叶变换的乘积。 GAMMA的卷积积分和物体透射率给出了相长和相消区域。实验结果表明，在相长干涉区域处放置小的透明开口可增强所需位置的光强度。通过将此方法应用于光学微光刻成像，可以用相对较少的计算量实现精细特征的分辨率增强。

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