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Femtosecond laser-induced damage of HfO_2/SiO_2 mirror with different stack structure

机译：飞秒激光对不同堆垛结构的HfO_2 / SiO_2反射镜的损伤

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摘要

Laser-induced damage of the "standard" (λ/4 stack structure) and "modified" (reduced standing-wave field) HfO_2/SiO_2 mirrors were investigated by a commercial 800 nm Ti:sapphire laser system. Three kinds of pulse duration of 50 fs, 105 fs, and 135 fs were chosen. The results show that the single-shot damage threshold of the "modified" mirror was about 14%-23% higher compared to that of the "standard" mirror. A model based on the rate equation for free electron generation was adopted to explain the threshold results. It took in account the transient changes in the dielectric function of material during the laser pulse. The simulated threshold agreed with the experimental very well. Besides, for two kinds of mirror, typical breakdown craters for both the single-shots and multi-shots damage tests reveal striking distinct characteristics. Interestingly, the multi-shots damage crater with zigzag-like edge was observed only on the "standard" mirror. These phenomena were illustrated reasonably by the distribution features of the electric field intensity within the mirrors.
机译：通过商业化的800 nm Ti：蓝宝石激光系统研究了“标准”（λ/ 4堆叠结构）和“改良”（减小的驻波场）HfO_2 / SiO_2反射镜的激光诱导损伤。选择了50 fs，105 fs和135 fs的三种脉冲持续时间。结果表明，与“标准”镜相比，“改进型”镜的单发损伤阈值高约14％-23％。采用基于自由电子生成速率方程的模型来解释阈值结果。考虑了激光脉冲期间材料介电功能的瞬态变化。模拟阈值与实验非常吻合。此外，对于两种镜子，单发和多发损伤测试的典型击穿坑都具有鲜明的特征。有趣的是，仅在“标准”反射镜上观察到锯齿状边缘的多发弹坑。这些现象通过反射镜内电场强度的分布特征得到了合理说明。

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