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Radiant exposure level comparison between Gaussian and top hat beams in various scanning patterns

机译:高斯光束和礼帽光束在各种扫描模式下的辐射曝光水平比较

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The radiant exposure of optical irradiation beams with different scanning parameters has been theoretically studied. We analyzed the difference in radiant exposure introduced by Gaussian and top hat beams. Various parameters such as scanning pattern, aperture position, beam size and scan spacing were also introduced in this study. We found that Gaussian beams introduce higher calculated radiant exposure to the aperture than top hat beams for certain beam size to aperture size ratios. However, as the scan spacing decreases, the radiant exposure difference calculated from Gaussian and top hat beams diminishes. (C) 2014 Optical Society of America
机译:从理论上研究了具有不同扫描参数的光辐射束的辐射暴露。我们分析了高斯光束和高顶礼帽光束引入的辐射暴露的差异。这项研究还介绍了各种参数,例如扫描图案,光圈位置,光束大小和扫描间隔。我们发现,对于某些光束尺寸与光圈尺寸之比,高斯光束对光圈的辐射辐射要比礼帽光束高。但是,随着扫描间距的减小,根据高斯光束和高顶礼帽光束计算出的辐射暴露差异会减小。 (C)2014年美国眼镜学会

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