Photosensitivity of gallium-doped silica core fiber to 193 nm ArF excimer laser

Gunawardena Dinusha S.; Mat-Sharif Khairul A.; Tamchek Nizam; Lai Man-Hong; Omar Nasr Y. M.; Emami Siamak D.; Muhamad-Yasin Shahrin Z.; Zulkifli Mohd I.; Yusoff Zulfadzli; Abdul-Rashid Hairul. A.; Lim Kok-Sing; Ahmad Harith

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Photosensitivity of gallium-doped silica core fiber to 193 nm ArF excimer laser

机译：掺镓硅芯光纤对193 nm ArF准分子激光的光敏性

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Grating inscription in a Ga-doped silica core fiber (similar to 5 wt. % Ga) has been demonstrated using ArF (193 nm) and KrF (248 nm) excimer lasers. In a comparative study with germanosilicate fiber with similar Ge concentration, a Ga-doped silica core fiber shows greater photosensitivity to an ArF excimer laser due to the higher absorbance in the region of 190-195 nm. In addition, the photosensitivity of a Ga-doped silica core fiber has been greatly enhanced with hydrogenation. Ga-doped fibers are potential photosensitive fibers for fiber Bragg grating production with an ArF excimer laser. (C) 2015 Optical Society of America

机译：已经使用ArF（193 nm）和KrF（248 nm）准分子激光器证明了掺Ga石英芯光纤（类似于5 wt。％Ga）中的光栅铭文。在具有相似Ge浓度的锗硅酸盐纤维的比较研究中，由于在190-195 nm范围内有较高的吸收率，所以掺Ga的二氧化硅芯纤维对ArF准分子激光表现出更高的光敏性。另外，通过氢化，大大地提高了掺杂Ga的二氧化硅芯纤维的光敏性。掺Ga的光纤是潜在的光敏纤维，用于使用ArF准分子激光器生产布拉格光栅。（C）2015年美国眼镜学会

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《Applied optics》 |2015年第17期|共5页
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Gunawardena Dinusha S.; Mat-Sharif Khairul A.; Tamchek Nizam; Lai Man-Hong; Omar Nasr Y. M.; Emami Siamak D.; Muhamad-Yasin Shahrin Z.; Zulkifli Mohd I.; Yusoff Zulfadzli; Abdul-Rashid Hairul. A.; Lim Kok-Sing; Ahmad Harith;
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1. Photosensitivity of gallium-doped silica core fiber to 193 nm ArF excimer laser [J] . Gunawardena Dinusha S., Mat-Sharif Khairul A., Tamchek Nizam, Applied optics . 2015,第17期

机译：掺镓硅芯光纤对193 nm ArF准分子激光的光敏性
2. Laser gain measurements at 193 nm in a small discharge cell containing ArF excimer laser gas mixtures [J] . A.V. AZAROV, P.J.M. PETERS, K.-J. BOLLER Applied physics . 2008,第3a4期

机译：在包含ArF准分子激光气体混合物的小型放电室中在193 nm处进行激光增益测量
3. "Orientation teeth" in non-mechanical laser corneal trephination for penetrating keratoplasty: 2.94 microm Er:YAG v 193 nm ArF excimer laser. [J] . Behrens A, Seitz B, Kuchle M, British journal of ophthalmology . 1999,第9期

机译：非机械激光角膜脱敏术中用于穿透性角膜移植的“定向齿”：2.94微米Er：YAG v 193 nm ArF准分子激光。
4. High photosensitivity of Al_(2)O_(3)-doped fibers to 193 nm and 157 nm excimer laser irradiation [C] . Yu. V. Larionov, A.A. Rybaltovsky, S.L. Semjonov, Bragg Gratings Photosensitivity and Poling in Glass Waveguides . 2003

机译：AL_（2）O_（3）的高光敏性 - 掺杂纤维至193nm和157nm准分子激光照射
5. Development of distributed feedback dye lasers for generation of high-power 193 nm excimer laser short pulses. [D] . Cui, Yifeng. 1993

机译：开发用于产生高功率193 nm准分子激光短脉冲的分布式反馈染料激光器。
6. Role of a 193 nm ArF Excimer Laser in Laser-Assisted Plasma-Enhanced Chemical Vapor Deposition of SiNx for Low Temperature Thin Film Encapsulation [O] . Kunsik An, Ho-Nyun Lee, Kwan Hyun Cho, 2020

机译：193 nm ArF受激准分子激光在激光辅助等离子体增强SiNx的化学气相沉积中的作用以进行低温薄膜封装
7. Luminescence of α-quartz crystal and silica glass under excitation of excimer lasers ArF (193 nm), KrF (248 nm) [O] . A.N. Trukhin 2017

机译：α-石英晶体和二氧化硅玻璃的发光在激光激发器（193nm），KRF（248nm）中的激发下
8. Pulsed Laser Deposition of Amorphous Diamond-Like Carbon Films With ArF (193 nm)Excimer Laser [R] . Xiong, F., Wang, Y. Y., Leppert, V., 1992

机译：用arF（193 nm）准分子激光脉冲激光沉积非晶类金刚石薄膜

Photosensitivity of gallium-doped silica core fiber to 193 nm ArF excimer laser

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