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Robust hybrid source and mask optimization to lithography source blur and flare

机译：针对光刻源的模糊和眩光的鲁棒混合源和掩模优化

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As a promising resolution enhancement technique, a set of pixelated source and mask optimization (SMO) methods has been introduced to further improve the lithography at 45 nm node and beyond. Recently, some papers studied the impact of the scanner errors on SMO, and the results revealed that the source blur and flare seriously impact on the lithography performance of the optimal source and mask resulting from SMO. However, current SMO methods did not propose an effective method to compensate for the impact of these nonideal factors of the actual scanners. To overcome this drawback, this paper focuses on developing a robust hybrid SMO (HSMO) method where the sensitivities of the aerial image to source blur and flare are introduced into the cost function. Simulation results are compared with traditional SMO to demonstrate the benefit of the proposed source blur-flare-aware HSMO method in pattern fidelity and process window. (C) 2015 Optical Society of America
机译：作为一种有前途的分辨率增强技术，已引入了一组像素化源和掩模优化（SMO）方法，以进一步改善45 nm节点及以后的光刻技术。最近，一些论文研究了扫描仪误差对SMO的影响，结果表明，光源模糊和眩光严重影响了SMO产生的最佳光源和掩模的光刻性能。但是，当前的SMO方法没有提出一种有效的方法来补偿实际扫描仪的这些非理想因素的影响。为了克服这个缺点，本文着重于开发一种鲁棒的混合SMO（HSMO）方法，其中将航空图像对源模糊和耀斑的敏感度引入成本函数中。仿真结果与传统SMO进行了比较，以证明所提源模糊耀斑HSMO方法在图案保真度和处理窗口方面的优势。 （C）2015年美国眼镜学会

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