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Observation of intermediate template directed SiC nanowire growth in Si-C-N systems

机译:Si-C-N系统中中间模板定向SiC纳米线生长的观察

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摘要

SiC nanowires (NWs) are commonly prepared in a Si-C-N system, but its formation mechanism is not fully understood. High resolution transmission electron microscopy and electron energy loss spectroscopy observation recorded the growth process of how Si _3N _4 NWs were transformed into SiC NWs, and demonstrated the validity of an intermediate template directed SiC NW growth via carbothermal reduction of intermediate Si _3N _4 NWs in a Si-C-N system. Based on this discovery, an intermediate-template growth mechanism of SiC NWs was proposed.
机译:SiC纳米线(NWs)通常是在Si-C-N系统中制备的,但其形成机理尚不完全清楚。高分辨率透射电子显微镜和电子能量损失谱观察记录了Si _3N _4 NWs如何转变为SiC NWs的生长过程,并证明了通过中间热Si _3N _4 NWs的碳热还原来指导中间模板定向SiC NW的有效性。 Si-CN系统。基于这一发现,提出了碳化硅纳米线的中间模板生长机理。

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