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Helium focused ion beam fabricated plasmonic antennas with sub-5 nm gaps

机译:氦聚焦离子束制造的间隙小于5 nm的等离子体天线

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摘要

We demonstrate a reliable fabrication method to produce plasmonic dipole nanoantennas with gap values in the range of 3.5-20 nm. The method combines electron beam lithography to create gold nanorods and helium focused ion beam milling to cut the gaps. Results show a reproducibility within 1 nm. Scattering spectra of antennas show a red shift of resonance wavelengths and an increase of the intensity of resonance peaks with a decrease of the gap size, which is in agreement with finite element simulations. The measured refractive index sensitivity was about 250 nm per refractive index unit for antennas with gap values below 5 nm.
机译:我们演示了一种可靠的制造方法来生产间隙值在3.5-20 nm范围内的等离子体偶极子纳米天线。该方法结合了电子束光刻技术来制造金纳米棒,并用氦聚焦离子束铣削来切割间隙。结果显示在1 nm内具有可重复性。天线的散射光谱显示出共振波长的红移和共振峰强度的增加,以及间隙尺寸的减小,这与有限元模拟是一致的。对于间隙值低于5 nm的天线,每个折射率单位测得的折射率灵敏度约为250 nm。

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