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Anisotropic graphene growth accompanied by step bunching on a dynamic copper surface

机译:各向异性石墨烯的生长伴随动态铜表面上的阶梯聚束

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We investigated the initial stage of chemical vapor deposition graphene growth on Cu film at low pressure, where Cu evaporation intensively occurs. Surface steps on the Cu surface were found to be the nucleation sites of graphene islands and to affect the subsequent growth. For the first time, we observed anisotropic graphene growth on the Cu surface accompanied by morphological changes, resulting in an arrayed graphene ribbon formation. The resultant surface morphology is attributed to step bunching during growth. Detailed analyses suggest that the graphene arrays, which were preferentially formed along the steps, served as partial shields of the Cu surface, preventing step-flow-like Cu atom diffusion and evaporation at the growth site. As a result, the growth locations acted as a pinning site of the step motion, leading to step bunching. Such selective growth by using surface morphology has the potential to control not only the nucleation site but also the geometry of graphene for tailoring graphene-based nanomaterials such as nanoribbons and quantum dots.
机译:我们研究了低压下在铜膜上化学气相沉积石墨烯生长的初始阶段,其中强烈发生了铜蒸发。发现Cu表面上的表面台阶是石墨烯岛的成核位点并影响随后的生长。首次,我们观察到在铜表面上各向异性石墨烯的生长并伴随着形态的变化,从而导致排列成阵列的石墨烯带。所得的表面形态归因于生长过程中的台阶聚束。详细的分析表明,优先沿着台阶形成的石墨烯阵列充当了Cu表面的部分屏蔽层,从而防止了台阶状的Cu原子在生长部位扩散和蒸发。结果,生长位置充当了脚步运动的固定点,从而导致脚步聚集。通过使用表面形态学的这种选择性生长不仅具有控制成核位点的潜力,而且还具有控制石墨烯的几何形状的潜力,用于定制基于石墨烯的纳米材料,例如纳米带和量子点。

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