Highly ordered freestanding titanium oxide nanotube arrays using Si-containing block copolymer lithography and atomic layer deposition

Ku S.J.; Jo G.C.; Bak C.H.; Kim S.M.; Shin Y.R.; Kim K.H.; Kwon S.H.; Kim J.-B.

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Highly ordered freestanding titanium oxide nanotube arrays using Si-containing block copolymer lithography and atomic layer deposition

机译：使用含硅嵌段共聚物光刻和原子层沉积的高度有序的独立式氧化钛纳米管阵列

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Highly ordered freestanding TiO_2 nanotube arrays with atomic layer control of wall thickness were fabricated using an organic-inorganic hybrid nanoporous template and atomic layer deposition (ALD). The hybrid nanoporous template with a high-aspect-ratio cylindrical nanopore array can be readily fabricated by pattern transfer from a thin silicon-containing block copolymer film into a thick cross-linked organic polymer layer. The template exhibited excellent thermal stability and thus allowed the high-temperature ALD process to conformally deposit TiO_2 thin films on the inner surface of cylindrical nanopores. The ultrafine thickness tunability of the ALD process made it possible to develop TiO_2 nanotubes with various wall thicknesses. After the template was removed using a dry etch followed by calcination, vertically aligned and highly crystalline anatase TiO_2 nanotube arrays were produced without collapse or bundling. We also fabricated the highly uniform freestanding arrays of multi-component nanotubes composed of TiO_2Al_(2O3)TiO_2 nanolaminate and Ti-Al-O mixed-phase films with precisely controlled thickness and composition.

机译：使用有机-无机杂化纳米多孔模板和原子层沉积（ALD）制备了具有壁厚的原子层控制的高度有序的独立式TiO_2纳米管阵列。通过从薄的含硅嵌段共聚物薄膜到厚的交联有机聚合物层的图案转移，可以容易地制造具有高纵横比的圆柱形纳米孔阵列的杂化纳米孔模板。该模板表现出优异的热稳定性，因此允许高温ALD工艺在圆柱纳米孔的内表面上共形沉积TiO_2薄膜。 ALD工艺的超细厚度可调谐性使得开发具有各种壁厚的TiO_2纳米管成为可能。在使用干法蚀刻随后进行煅烧除去模板后，产生了垂直排列且高度结晶的锐钛矿型TiO_2纳米管阵列，而没有塌陷或成束。我们还制造了由TiO_2Al_（2O3）TiO_2纳米层压板和Ti-Al-O混合相膜组成的具有均匀控制的厚度和成分的高度均匀的多组分纳米管独立阵列。

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《Nanotechnology》 |2013年第8期|共8页
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Ku S.J.; Jo G.C.; Bak C.H.; Kim S.M.; Shin Y.R.; Kim K.H.; Kwon S.H.; Kim J.-B.;
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1. Highly ordered freestanding titanium oxide nanotube arrays using Si-containing block copolymer lithography and atomic layer deposition [J] . Ku S.J., Jo G.C., Bak C.H., Nanotechnology . 2013,第8期

机译：使用含硅嵌段共聚物光刻和原子层沉积的高度有序的独立式氧化钛纳米管阵列
2. The fabrication of tunable nanoporous oxide surfaces by block copolymer lithography and atomic layer deposition [J] . Andreozzi A., Lamagna L., Seguini G., Nanotechnology . 2011,第33期

机译：通过嵌段共聚物光刻和原子层沉积制备可调节的纳米多孔氧化物表面
3. Circular Double‐Patterning Lithography Using a Block Copolymer Template and Atomic Layer Deposition [J] . Wan Zhixin, Lee Ha Jin, Kim Hyun Gu, Advanced materials interfaces . 2018,第16期

机译：使用嵌段共聚物模板和原子层沉积的圆形双图案化光刻
4. Area selective atomic layer deposition: Use of lithographically defined polymer masking layers for the deposition of titanium dioxide [C] . Ashwini Sinha, Dennis W. Hess, Clifford L. Henderson Advances in Resist Technology and Processing XXII pt.1 . 2005

机译：区域选择性原子层沉积：使用光刻定义的聚合物掩膜层沉积二氧化钛
5. Atomic layer deposition of titanium dioxide on silicon and gallium arsenate substrates using tetrakis-dimethylamido titanium and water precursors. [D] . Lacis, John W. 2009

机译：使用四-二甲基酰胺基钛和水前体在硅和砷化镓衬底上沉积二氧化钛的原子层。
6. Novel Antimicrobial Titanium Dioxide Nanotubes Obtained through a Combination of Atomic Layer Deposition and Electrospinning Technologies [O] . Carol López de Dicastillo, Cristian Patiño, María Jose Galotto, 2018

机译：通过结合原子层沉积和静电纺丝技术获得的新型抗菌钛白粉纳米管
7. Novel Antimicrobial Titanium Dioxide Nanotubes Obtained through a Combination of Atomic Layer Deposition and Electrospinning Technologies [O] . Carol López de Dicastillo, Cristian Patiño, María Galotto, 2018

机译：通过原子层沉积和静电纺丝技术的组合获得的新型抗微生物钛纳米管

Highly ordered freestanding titanium oxide nanotube arrays using Si-containing block copolymer lithography and atomic layer deposition

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