The atomic layer deposition array defined by etch-back technique: A new method to fabricate TiO _2 nanopillars, nanotubes and nanochannel arrays

Huang Y.; Pandraud G.; Sarro P.M.

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The atomic layer deposition array defined by etch-back technique: A new method to fabricate TiO _2 nanopillars, nanotubes and nanochannel arrays

机译：通过回蚀技术定义的原子层沉积阵列：一种新的制备TiO _2纳米柱，纳米管和纳米通道阵列的方法

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A novel fabrication method for nanostructures made of TiO _2, a hard-to-etch material with very attractive optical, physical and chemical properties, is developed. This technique atomic layer deposition array defined by etch-back (AARDE) enables the formation of a large area of perfectly ordered, high aspect ratio nanostructures, such as nanopillars, nanotubes and nanochannels. High quality functional surfaces and versatile structures with tunable dimensions on various substrates can be realized. With all the process steps being controllable and compatible with integrated circuits, high throughput and repeatability are achieved. To demonstrate the potential of this new technique, results for AARDE TiO _2 nanopillar arrays as photonic crystals are also reported.

机译：开发了一种新的纳米结构制备方法，该方法由具有难以吸引的光学，物理和化学性质的TiO _2制成。通过回蚀（AARDE）定义的这种原子层沉积阵列技术能够形成大面积的有序，高纵横比的纳米结构，例如纳米柱，纳米管和纳米通道。可以在各种基板上实现高质量的功能表面和尺寸可调的通用结构。通过所有过程步骤都是可控制的并且与集成电路兼容，可以实现高吞吐量和可重复性。为了证明这项新技术的潜力，还报道了将AARDE TiO _2纳米柱阵列作为光子晶体的结果。

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《Nanotechnology》 |2012年第48期|共8页
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Huang Y.; Pandraud G.; Sarro P.M.;
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1. The atomic layer deposition array defined by etch-back technique: A new method to fabricate TiO _2 nanopillars, nanotubes and nanochannel arrays [J] . Huang Y., Pandraud G., Sarro P.M. Nanotechnology . 2012,第48期

机译：通过回蚀技术定义的原子层沉积阵列：一种新的制备TiO _2纳米柱，纳米管和纳米通道阵列的方法
2. Ultraviolet photoresponse of TiO_2 nanotube arrays fabricated by atomic layer deposition [J] . Liu C.-M., Chen C., Cheng H.-E. Electrochemical and solid-state letters . 2011,第6期

机译：原子层沉积制备的TiO_2纳米管阵列的紫外光响应
3. CdSe-sensitized TiO_2 nanotube array film fabricated by ultrasonic-assisted electrochemical deposition and subsequently wrapped with TiO_2 thin layer for the visible light photoelectrocatalysis [J] . Jianglin Ouyang, Menglei Chang, Yuyuan Zhang, Thin Solid Films . 2012,第7期

机译：超声辅助电化学沉积制备CdSe敏化的TiO_2纳米管阵列膜，然后包裹TiO_2薄层用于可见光光电催化
4. An ALD Etch-back Method to Fabricate High Aspect Ratio Nanopillar Arrays for Photonic Crystal Sensors [C] . Yujian Huang, Gregory Pandraud, Pasqualina M. Sarro Eurosensor Conference . 2013

机译：用于制造光子晶体传感器的高纵横比纳米玻璃阵列的ALD蚀刻方法
5. Optoplasmonic Properties of Heterostructure Metamaterials Fabricated Using Glancing Angle and Atomic Layer Deposition Techniques & Analyzed Using Finite Element and Spectroscopic Ellipsometry Methods [D] . Kilic, Ufuk. 2021

机译：使用透明角和原子层沉积技术制造的异质结构超材料的晶状体性能，并使用有限元和光谱椭圆形测定方法分析
6. Photoelectrochemical Performance of Quantum dot-Sensitized TiO2 Nanotube Arrays: a Study of Surface Modification by Atomic Layer Deposition Coating [O] . Quan Zhou, Junchen Zhou, Min Zeng, 2017

机译：量子点敏化的TiO2纳米管阵列的光电化学性能：原子层沉积涂层表面改性的研究
7. Enhanced photoresponse of conformal TiO2/Ag nanorod array-based Schottky photodiodes fabricated via successive glancing angle and atomic layer deposition [O] . Haider, A., Cansizoglu, H., Cansizoglu, M. F., 2015

机译：通过连续掠射角和原子层沉积制备的基于保形TiO2 / Ag纳米棒阵列的肖特基光电二极管的增强的光响应

The atomic layer deposition array defined by etch-back technique: A new method to fabricate TiO _2 nanopillars, nanotubes and nanochannel arrays

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