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High performance tunnel field-effect transistor by gate and source engineering

机译:栅极和源极工程技术的高性能隧道场效应晶体管

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As one of the most promising candidates for future nanoelectronic devices, tunnel field-effect transistors (TFET) can overcome the subthreshold slope (SS) limitation of MOSFET, whereas high ON-current, low OFF-current and steep switching can hardly be obtained at the same time for experimental TFETs. In this paper, we developed a new nanodevice technology based on TFET concepts. By designing the gate configuration and introducing the optimized Schottky junction, a multi-finger-gate TFET with a dopant-segregated Schottky source (mFSB-TFET) is proposed and experimentally demonstrated. A steeper SS can be achieved in the fabricated mFSB-TFET on the bulk Si substrate benefiting from the coupled quantum band-to-band tunneling (BTBT) mechanism, as well as a high I-ON/I-OFF ratio (similar to 10(7)) at V-DS = 0.2 V without an area penalty. By compatible SOI CMOS technology, the fabricated Si mFSB-TFET device was further optimized with a high I-ON/I-OFF ratio of similar to 10(8) and a steeper SS of over 5.5 decades of current. A minimum SS of below 60 mV dec(-1) was experimentally obtained, indicating its dominant quantum BTBT mechanism for switching.
机译:作为未来纳米电子器件最有希望的候选者之一,隧道场效应晶体管(TFET)可以克服MOSFET的亚阈值斜率(SS)的局限性,而在这种情况下很难获得高导通电流,低截止电流和陡峭的开关同时进行实验性TFET。在本文中,我们基于TFET概念开发了一种新的纳米器件技术。通过设计栅极配置并引入优化的肖特基结,提出并通过实验证明了具有掺杂物隔离肖特基源极(mFSB-TFET)的多指栅TFET。得益于耦合的量子带到带隧穿(BTBT)机制以及高的I-ON / I-OFF比(大约为10),可以在块状Si衬底上的mFSB-TFET中制造出更陡的SS (7))在V-DS = 0.2 V时没有面积损失。通过兼容的SOI CMOS技术,可以进一步优化所制造的Si mFSB-TFET器件,使其具有接近10(8)的高I-ON / I-OFF比和超过5.5倍电流的更陡的SS。实验获得了低于60 mV dec(-1)的最小SS,表明其主要的量子BTBT转换机制。

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