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Oxygen environmental and passivation effects on molybdenum disulfide field effect transistors

机译:氧环境和钝化对二硫化钼场效应晶体管的影响

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We investigated the effects of passivation on the electrical characteristics of molybdenum disulfide (MoS_2) field effect transistors (FETs) under nitrogen, vacuum, and oxygen environments. When the MoS_2 FETs were exposed to oxygen, the on-current decreased and the threshold voltage shifted in the positive gate bias direction as a result of electrons being trapped by the adsorbed oxygen at the MoS_2 surface. In contrast, the electrical properties of the MoS_2 FETs changed only slightly in the different environments when a passivation layer was created using polymethyl methacrylate (PMMA). Specifically, the carrier concentration of unpassivated devices was reduced to 6.5 × 10~(15) cm~(-2) in oxygen from 16.3 × 10~(15) cm~(-2) in nitrogen environment. However, in PMMA-passivated devices, the carrier concentration remained nearly unchanged in the range of 1-3 × 10~(15) cm ~(-2) regardless of the environment. Our study suggests that surface passivation is important for MoS2-based electronic devices.
机译:我们研究了钝化对氮,真空和氧环境下二硫化钼(MoS_2)场效应晶体管(FET)的电特性的影响。当MoS_2 FET暴露于氧气时,由于电子被MoS_2表面的吸附氧俘获,导通电流降低,阈值电压沿正栅极偏置方向移动。相反,当使用聚甲基丙烯酸甲酯(PMMA)创建钝化层时,在不同的环境中MoS_2 FET的电性能仅略有变化。具体而言,氧气中未钝化器件的载流子浓度从氮气环境中的16.3×10〜(15)cm〜(-2)降至6.5×10〜(15)cm〜(-2)。然而,在PMMA钝化器件中,不管环境如何,载流子浓度在1-3×10〜(15)cm〜(-2)的范围内几乎保持不变。我们的研究表明,表面钝化对于基于MoS2的电子设备很重要。

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