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Direct investigation of silver photodissolution dynamics and reversibility in arsenic trisulphide thin films by atomic force microscopy

机译:原子力显微镜直接研究三硫化砷薄膜中银的光溶解动力学和可逆性

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The dynamics and reversibility of Ag nanoparticle photodissolution into As_2S_3 chalcogenide thin films have uniquely been directly measured by continuous AFM imaging during patterned optical illumination. The surface morphology, roughness and particle size distribution have thus been spatially and statistically monitored as a function of time, both during and following optical exposure. Photodissolution was observed to proceed via two mechanisms. In one case, nanoparticles abruptly and nearly completely disappeared along a sharp dissolution front traveling laterally at ~0.19 μm s~(-1). Following illumination, similarly sized nanoparticles uniformly reformed on the surface. A more inhomogeneous photodissolution process was separately recorded, clearing irregular ~1-2 μm patches that grew with time until most of the surface was free of nanoparticles. Post-illumination, surface nanoparticle development and coverage were similarly inhomogeneous, with larger but 50% fewer particles in the final distribution. In every experiment, an initial roughening was detected before the nanoparticle surface coverage visually diminished, indicating the onset of photodissolution at widely distributed energetically and kinetically favored sites which temporarily enhances nanoscale roughness. Such direct studies of surface dynamics are crucial to understanding and ultimately optimizing chalcogenide film applications such as photomasks, optoelectronics media and bio-chemical sensors.
机译:Ag纳米粒子光溶解到As_2S_3硫族化物薄膜中的动力学和可逆性已通过图案化光学照明过程中的连续AFM成像直接进行了直接测量。因此,在曝光期间和曝光之后,随时间在空间和统计上监测了表面形态,粗糙度和粒度分布。观察到光溶解通过两种机理进行。在一种情况下,纳米颗粒突然突然消失,并沿着〜0.19μms〜(-1)侧向移动的急剧溶解前沿几乎完全消失。照射后,大小相似的纳米颗粒在表面均匀地重整。分别记录了更不均匀的光溶解过程,清除了不规则的〜1-2μm斑块,该斑块随着时间的增长而生长,直到大部分表面没有纳米颗粒为止。照明后,表面纳米粒子的发展和覆盖情况同样不均匀,最终分布中的粒子更大但减少了50%。在每个实验中,在视觉上减小纳米颗粒表面覆盖率之前,都检测到了初始的粗糙化,这表明在能量和动力学上广泛分布的,有利于暂时增加纳米级粗糙度的位置处开始出现光溶解。这种对表面动力学的直接研究对于理解和最终优化硫族化物薄膜应用(例如光掩模,光电介质和生化传感器)至关重要。

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