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Method for making a single-step etch mask for 3D monolithic nanostructures

机译：用于3d整体纳米结构的单步蚀刻掩模的制造方法

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Current nanostructure fabrication by etching is usually limited to planar structures as they are defined by a planar mask. The realization of three-dimensional (3D) nanostructures by etching requires technologies beyond planar masks. We present a method for fabricating a 3D mask that allows one to etch three-dimensional monolithic nanostructures using only CMOS-compatible processes. The mask is written in a hard-mask layer that is deposited on two adjacent inclined surfaces of a Si wafer. By projecting in a single step two different 2D patterns within one 3D mask on the two inclined surfaces, the mutual alignment between the patterns is ensured. Thereby after the mask pattern is defined, the etching of deep pores in two oblique directions yields a three-dimensional structure in Si. As a proof of concept we demonstrate 3D mask fabrication for three-dimensional diamond-like photonic band gap crystals in silicon. The fabricated crystals reveal a broad stop gap in optical reflectivity measurements. We propose how 3D nanostructures with five different Bravais lattices can be realized, namely cubic, tetragonal, orthorhombic, monoclinic and hexagonal, and demonstrate a mask for a 3D hexagonal crystal. We also demonstrate the mask for a diamond-structure crystal with a 3D array of cavities. In general, the 2D patterns on the different surfaces can be completely independently structured and still be in perfect mutual alignment. Indeed, we observe an alignment accuracy of better than 3.0 nm between the 2D mask patterns on the inclined surfaces, which permits one to etch well-defined monolithic 3D nanostructures.
机译：当前通过蚀刻制造的纳米结构通常限于平面结构，因为它们是由平面掩模限定的。通过蚀刻实现三维（3D）纳米结构需要的技术不仅限于平面掩模。我们提出了一种制造3D掩模的方法，该方法允许仅使用CMOS兼容工艺来蚀刻三维整体纳米结构。将掩模写入硬掩模层中，该硬掩模层沉积在Si晶片的两个相邻倾斜表面上。通过一步一步将两个不同的2D图案投影到两个倾斜表面上的一个3D蒙版中，可以确保图案之间的相互对齐。由此，在限定了掩模图案之后，在两个倾斜方向上的深孔的蚀刻产生Si中的三维结构。作为概念验证，我们演示了用于硅中三维钻石状光子带隙晶体的3D掩模制造。制成的晶体在光反射率测量中显示出宽广的停止间隙。我们提出了如何实现具有五个不同Bravais晶格的3D纳米结构，即立方，四边形，正交，单斜晶和六边形，并演示了用于3D六边形晶体的掩模。我们还演示了具有3D腔阵列的金刚石结构晶体的掩模。通常，不同表面上的2D图案可以完全独立地构造，并且仍然可以完美地相互对齐。确实，我们观察到倾斜表面上的2D掩模图案之间的对准精度优于3.0 nm，这允许人们蚀刻定义明确的整体式3D纳米结构。

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