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Post-directed-self-assembly membrane fabrication for in situ analysis of block copolymer structures

机译：定向自组装膜制备用于嵌段共聚物结构的原位分析

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摘要

Full characterization of the three-dimensional structures resulting from the directed self-assembly (DSA) of block copolymers (BCP) remains a difficult challenge. Transmission electron microscope (TEM) tomography and resonant soft x-ray scattering have emerged as powerful and complementary methods for through-film characterization; both techniques require samples to be prepared on specialized membrane substrates. Here we report a generalizable process to implement BCP DSA with density multiplication on silicon nitride membranes. A key feature of the process developed here is that it does not introduce any artefacts or damage to the polymer assemblies as DSA is performed prior to back-etched membrane formation. Because most research and applications of BCP lithography are based on silicon substrates, process variations introduced by implementing DSA on a silicon nitride/silicon stack versus silicon were identified and mitigated. Using full-wafers, membranes were fabricated with different sizes and layouts to enable both. TEM and x-ray characterization. Finally, both techniques were used to characterize structures resulting from the DSA of lamella-forming BCP with density multiplication.
机译：由嵌段共聚物（BCP）的定向自组装（DSA）产生的三维结构的完整表征仍然是一个难题。透射电子显微镜（TEM）层析成像和共振软X射线散射已经成为通透膜表征的强大且互补的方法。两种技术都需要在专门的膜基材上制备样品。在这里，我们报告了在氮化硅膜上实现密度倍增的BCP DSA的通用过程。此处开发的方法的关键特征是，由于在回蚀膜形成之前进行DSA，因此不会对聚合物组件造成任何伪影或损坏。由于BCP光刻技术的大多数研究和应用都是基于硅衬底的，因此可以识别和缓解通过在氮化硅/硅叠层上相对于硅实施DSA引入的工艺变化。使用全晶片，可制造出具有不同尺寸和布局的膜，以实现两者。 TEM和X射线表征。最后，两种技术都被用来表征由密度相乘形成薄片的BCP的DSA产生的结构。

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