• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Nanotechnology >Observation of nanoscale adhesion, friction and wear between ALD Al2O3 coated silicon MEMS sidewalls
【24h】

Observation of nanoscale adhesion, friction and wear between ALD Al2O3 coated silicon MEMS sidewalls

机译：观察ALD Al2O3涂层的硅MEMS侧壁之间的纳米级附着力，摩擦和磨损

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

We report a novel investigation of the tribological properties of aluminum oxide (Al2O3) when it is used as protective coating on the sidewalls of microelectromechanical systems (MEMS). By using an in-house built optical displacement measurement system, we were able to measure the on-chip displacements with an unprecedented resolution of 2 nm. This corresponds to 2 nN and 9 nN force resolution, respectively, depending on whether an adhesion or a friction sensor MEMS device was used for the measurement. Al2O3 was deposited on the vertical etched sidewalls using atomic layer deposition (ALD). All tests were carried out in ambient conditions. The same tests carried out on uncoated polysilicon devices were not reproducible due to stiction, which sometimes prevented the interacting surfaces from moving once contact was made. The higher adhesion of silicon was also found to hinder the mobility of the slider. In the ALD-coated devices, we observed increasing adhesion after 50000 repeated contacts. We attribute this increase to the accumulation of aluminum hydroxide debris produced by the reaction with moisture in the environment. We also investigated the long-term effect of friction on the coated silicon sidewalls. The dissipated energy decreases, with a minimum lateral force occurring around the 1000th cycle. After 1000 cycles, the lateral displacement decreases, suggesting an additional lateral dragging force caused by the interaction between a mixture of aluminum hydroxides and water. However, the small overall amount of debris produced during the friction test indicates the outstanding characteristic of Al2O3 as a protective coating for MEMS that use contacting or sliding interfaces.
机译：当氧化铝（Al2O3）用作微机电系统（MEMS）侧壁上的保护涂层时，我们报告了氧化铝（Al2O3）的摩擦学性能研究。通过使用内置的光学位移测量系统，我们能够以前所未有的2 nm分辨率测量芯片上的位移。这取决于是将粘附力传感器还是将摩擦传感器MEMS器件用于测量，分别对应于2 nN和9 nN力分辨率。使用原子层沉积（ALD）将Al2O3沉积在垂直蚀刻的侧壁上。所有测试均在环境条件下进行。由于粘着性，在未涂覆的多晶硅器件上进行的相同测试无法重现，有时一旦接触，相互作用的表面就无法移动。还发现硅的较高粘附性阻碍了滑块的移动性。在ALD涂层器件中，我们观察到50000次重复接触后粘合力增加。我们将此增加归因于与环境中的水分反应而产生的氢氧化铝碎片的积累。我们还研究了摩擦对涂层硅侧壁的长期影响。耗散的能量减少，在第1000个周期左右出现最小的横向力。在1000个循环之后，横向位移减小，表明由氢氧化铝和水的混合物之间的相互作用引起的附加横向拖曳力。但是，在摩擦测试过程中产生的碎屑总量很少，表明Al2O3作为用于使用接触或滑动界面的MEMS的保护涂层的突出特性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号