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Atomic step-and-terrace surface of polyimide sheet for advanced polymer substrate engineering

机译：先进聚合物基材工程用聚酰亚胺片的原子阶跃面

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摘要

Typical thermostable and flexible polyimide polymers exhibit many excellent properties such as strong mechanical and chemical resistance. However, in contrast to single-crystal substrates like silicon or sapphire, polymers mostly display disordered and rough surfaces, which may result in instability and degradation of the interfaces between thin films and polymer substrates. As a step toward the development of next-generation polymer substrates, we here report single-atom-layer imprinting onto the polyimide sheets, resulting in an ultrasmooth 0.3 nm high atomic step-and-terrace surface on the polyimides. The ultrasmooth polymer substrates are expected to be applied to the fabrication of nanostructures such as superlattices, nanowires, or quantum dots in nanoscale-controlled electronic devices. We fabricate smooth and atomically stepped indium tin oxide transparent conducting oxide thin films on the imprinted polyimide sheets for future use in organic-based optoelectronic devices processed with nanoscale precision. Furthermore, toward 2D polymer substrate nanoengineering, we demonstrate nanoscale letter writing on the atomic step-and-terrace polyimide surface via atomic force microscopy probe scratching.
机译：典型的热稳定和柔性的聚酰亚胺聚合物表现出许多优异的性能，例如强大的机械和化学耐性。然而，与诸如硅或蓝宝石的单晶衬底相反，聚合物大多显示出无序且粗糙的表面，这可能导致薄膜和聚合物衬底之间的界面不稳定和退化。作为开发下一代聚合物基材的一个步骤，我们在此报告在聚酰亚胺板上印制单原子层，从而在聚酰亚胺上形成超光滑的0.3 nm高原子阶梯式表面。预计超光滑聚合物基材将用于制造纳米结构控制的电子设备中的纳米结构，例如超晶格，纳米线或量子点。我们在压印的聚酰亚胺板上制作了光滑且原子阶梯状的铟锡氧化物透明导电氧化物薄膜，以供将来以纳米级精度加工的有机基光电器件中使用。此外，对于2D聚合物基材纳米工程，我们通过原子力显微镜探针刮擦演示了在原子阶梯式聚酰亚胺表面上的纳米级字母书写。

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