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Surface chemistry of black phosphorus under a controlled oxidative environment

机译：受控氧化环境下黑磷的表面化学

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摘要

Black phosphorus (BP), the bulk counterpart of monolayer phosphorene, is a relatively stable phosphorus allotrope at room temperature. However, monolayer phosphorene and ultra-thin BP layers degrade in ambient atmosphere. In this paper, we report the investigation of BP oxidation and discuss the reaction mechanism based on the x-ray photoelectron spectroscopy (XPS) data. The kinetics of BP oxidation was examined under various well-controlled conditions, namely in 5% O-2/Ar, 2.3% H2O/Ar, and 5% O-2 and 2.3% H2O/Ar. At room temperature, the BP surface is demonstrated not to be oxidized at a high oxidation rate in 5% O2/Ar nor in 2.3% H2O/Ar, according to XPS, with the thickness of the oxidized phosphorus layer <5 angstrom for 5 h. On the other hand, in the O-2/H2O mixture, a 30 angstrom thickness oxide layer was detected already after 2 h of the treatment. This result points to a synergetic effect of water and oxygen in the BP oxidation. The oxidation effect was also studied in applications to the electrical measurements of BP field-effect transistors (FETs) with or without passivation. The electrical performance of BP FETs with atomic layer deposition (ALD) dielectric passivation or h-BN passivation formed in a glove-box environment are also presented.
机译：黑磷（BP）是单层phosphor的主要对应物，在室温下是一种相对稳定的磷同素异形体。但是，单层磷化层和超薄BP层在环境大气中会降解。在本文中，我们报告了BP氧化的研究，并基于X射线光电子能谱（XPS）数据讨论了反应机理。在各种良好控制的条件下（即在5％O-2 / Ar，2.3％H2O / Ar和5％O-2和2.3％H2O / Ar中）检查了BP氧化的动力学。 XPS证明，在室温下，BP表面在5％O2 / Ar或2.3％H2O / Ar中均不会以高氧化速率被氧化，氧化磷层的厚度<5埃达5小时。另一方面，在O-2 / H2O混合物中，处理2小时后已经检测到30埃厚的氧化层。该结果表明水和氧气在BP氧化中的协同作用。在有或没有钝化的BP场效应晶体管（FET）的电气测量中，也研究了氧化效应。还介绍了在手套箱环境中形成的具有原子层沉积（ALD）电介质钝化或h-BN钝化的BP FET的电性能。

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