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Development characteristics of polymethyl methacrylate in alcohol/water mixtures: a lithography and Raman spectroscopy study

机译：醇/水混合物中聚甲基丙烯酸甲酯的显影特性：光刻和拉曼光谱研究

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摘要

Poly methyl methacrylate (PMMA) is the most widely used resist in electron beam lithography. This paper reports on a lithography and Raman spectroscopy study of development characteristics of PMMA in methanol, ethanol and isopropanol mixtures with water as developers. We have found that ethanol/water mixtures at a 4:1 volume ratio are an excellent, high resolution, non-toxic developer for exposed PMMA. We have also found that the proper methodology to use so that contrast data can be compared to techniques used in polymer science is not to rinse the developed resist but to immediately dry with nitrogen. Our results show how powerful simple lithographic techniques can be used to study ternary polymer solvent solutions when compared to other techniques used in the literature. Raman data show that both tightly bonded -OH groups and non-hydrogen bonded -OH groups play a role in the development of PMMA. Tightly hydrogen bonded -OH groups show pure Lorentzian Raman absorption only in the concentration ranges where ethanol/water and IPA/water mixtures are effective developers of PMMA, pointing to possible ordering or reduced amorphization due to the liquid state. The impact of understanding these interactions may open doors to a new developers of other electron beam resists that can reduce the toxicity of the waste stream.
机译：聚甲基丙烯酸甲酯（PMMA）是电子束光刻中使用最广泛的抗蚀剂。本文报道了用光刻和拉曼光谱研究的PMMA在甲醇，乙醇和异丙醇与水为显影剂的混合物中的显影特性。我们发现，体积比为4：1的乙醇/水混合物是暴露的PMMA的极佳，高分辨率，无毒显影剂。我们还发现，可以将对比数据与聚合物科学中使用的技术进行比较的正确方法不是冲洗显影后的抗蚀剂，而是立即用氮气干燥。我们的结果表明，与文献中使用的其他技术相比，简单的光刻技术可以多么强大地用于研究三元聚合物溶剂溶液。拉曼数据显示，紧密键合的-OH基团和非氢键合的-OH基团均在PMMA的开发中起作用。氢键紧紧的-OH基团仅在乙醇/水和IPA /水混合物是PMMA的有效显影剂的浓度范围内显示纯的洛伦兹拉曼吸收，这表明由于液态可能导致有序化或非晶化程度降低。了解这些相互作用的影响可能为其他电子束抗蚀剂的新开发者打开大门，这些新电子抗蚀剂可以减少废物流的毒性。

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