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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Evidence for Initiation of Thermal Reactions of Alkenes with Hydrogen-Terminated Silicon by Surface-Catalyzed Thermal Decomposition of the Reactant
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Evidence for Initiation of Thermal Reactions of Alkenes with Hydrogen-Terminated Silicon by Surface-Catalyzed Thermal Decomposition of the Reactant

机译：通过表面催化反应物的热分解引发烯烃与氢封端的硅发生热反应的证据

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摘要

New insights into the mechanism of thermal reactions of alkenes with hydrogen terminated silicon are presented. Scanning tunneling microscopy (STM) imaging at the early stages of the reaction of 1-decene with H/Si(111) at 150 degrees C confirm this reaction occurs via a propagating radical chain mechanism. In addition, evidence is presented for an initiation mechanism involving degradation of hydrocarbon molecules catalyzed by the silanol surface of Schlenk tubes commonly used in carrying out these reactions. Hydrogen-terminated silicon surfaces are found to be unstable in the "inert" solvent dodecane when heated at 150 degrees C in a Pyrex Schlenk tube. By contrast, the surfaces were significantly more stable at the same temperature when reactions were carried out in Teflon (polytetrafluoroethylene or PTFE). The thermal reaction of decene with H/Si(111) was found to proceed more rapidly in Pyrex than in PTFE, consistent with an impurity-based initiation mechanism.
机译：提出了烯烃与氢封端的硅热反应机理的新见解。 1-癸烯与H / Si（111）在150摄氏度下反应的早期阶段的扫描隧道显微镜（STM）成像证实此反应是通过自由基自由基链机制传播的。另外，提供了引发机制的证据，该引发机制涉及通常用于进行这些反应的Schlenk管的硅烷醇表面催化的烃分子的降解。当在Pyrex Schlenk管中加热到150摄氏度时，在“惰性”溶剂十二烷中发现氢封端的硅表面不稳定。相反，当在特氟隆（聚四氟乙烯或PTFE）中进行反应时，表面在相同温度下明显更稳定。发现癸烯与H / Si（111）的热反应在Pyrex中比在PTFE中进行得更快，这与基于杂质的引发机理一致。

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