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High index contrast Er:Ta_(2)O_(5) waveguide amplifier on oxidised silicon

机译:氧化硅上的高折射率对比度Er:Ta_(2)O_(5)波导放大器

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摘要

We report a high index contrast erbium doped tantalum pentoxide waveguide amplifier. 2.3 cm long waveguides with erbium concentration of 2.7 X 10~(20) cm~(-3) were fabricated by magnetron sputtering of Er-doped tantalum pentoxide on oxidised silicon substrates and Ar-ion milling with photolithographically defined mask. A net on-chip optical gain of approx2.25 dB/cm at 1531.5 nm was achieved with 20 mW of pump power at 977 nm launched into the waveguide. The pump threshold for transparency was 4.5 mW.
机译:我们报告了高折射率对比contrast掺杂五氧化二钽波导放大器。通过磁控溅射of掺杂的五氧化二钽在氧化硅衬底上并用光刻定义的掩模进行Ar离子铣削,制得了2.3 cm长,concentration浓度为2.7 X 10〜(20)cm〜(-3)的波导。通过在977nm处发射20 mW的泵浦功率,在1531.5 nm处实现约2.25 dB / cm的净片上光学增益。透明度的泵浦阈值为4.5 mW。

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