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首页> 外文期刊>Optics Communications: A Journal Devoted to the Rapid Publication of Short Contributions in the Field of Optics and Interaction of Light with Matter >Flat Gauss illumination for the step-and-scan lithographic system
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Flat Gauss illumination for the step-and-scan lithographic system

机译：步进扫描光刻系统的平板高斯照明

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摘要

To meet the uniform dose exposure in optical lithography, it is desirable to get uniform illumination in the scanning direction on wafer for the step-and-scan lithographic system. We present a flat Gauss illumination for the step-and-scan lithographic system in this paper. Through flat Gauss illumination in scanning direction, pulse quantization effect could be reduced effectively. Correspondingly, the uniformity of the reticle and wafer is improved. Compared with the trapezoid illumination, flat Gauss illumination could keep the slit edge fixed, and pulse quantization effect will not be enhanced. Moreover flat Gauss illumination could be obtained directly without defocusing and blocking, which results in high energy efficiency and high throughput of the lithography. A design strategy for flat Gauss illumination is also proposed which offers high uniformity illumination, fixed slope and integral energy of flat Gauss illumination in different coherence factors. The strategy describes a light uniform device which contains first microlens array, second microlens array, one-dimensional Gauss diffuser and a Fourier lens. The device produces flat Gauss illumination directly at the scanning slit. The design and simulation results show that the uniformity of flat Gauss illumination in two directions satisfy the requirements of lithographic illumination system and the slope. In addition, slit edge of flat Gauss illumination does not change. (C) 2016 Published by Elsevier B.V.
机译：为了满足光学光刻中的均匀剂量曝光，对于步进扫描光刻系统，期望在晶片的扫描方向上获得均匀的照明。在本文中，我们为步进扫描光刻系统提出了一种平坦的高斯照明。通过在扫描方向上进行平坦的高斯照明，可以有效降低脉冲量化效果。相应地，掩模版和晶片的均匀性得到改善。与梯形照明相比，平坦的高斯照明可以使狭缝边缘保持固定，并且不会增强脉冲量化效果。而且，可以直接获得平坦的高斯照明而不会散焦和遮挡，这导致了高能量效率和高光刻量。还提出了平面高斯照明的设计策略，该策略在不同相干因子下提供高均匀度照明，固定斜率和平面高斯照明的积分能量。该策略描述了一种光均匀装置，其包括第一微透镜阵列，第二微透镜阵列，一维高斯漫射器和傅立叶透镜。该设备直接在扫描缝隙处产生平坦的高斯照明。设计和仿真结果表明，平板高斯照明在两个方向上的均匀性满足光刻照明系统和斜率的要求。另外，平面高斯照明的狭缝边缘不会改变。 （C）2016由Elsevier B.V.发布

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