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首页> 外文期刊>Optics Letters >Nanomembrane transfer process for intricate photonic device applications
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Nanomembrane transfer process for intricate photonic device applications

机译：用于复杂光子器件应用的纳米膜转移工艺

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摘要

We demonstrate a process for the fabrication and transfer of silicon nanomembranes (Si-NMs) that have been released from their host substrates and redeposited on foreign flexible or flat substrates. The transfer process developed allows intricate photonic devices to be transferred via NMs to a variety of new substrate materials. This allows the transferred devices to benefit from the material properties of both substrate and NM. Our process is designed to transfer and stack large-area photonic devices without compromising their optical performance. The process has been used to transfer large-area unpatterned silicon NMs, in excess of 2.5 cm~(2), and photonic devices with intricate device designs containing various fill factors. We have also demonstrated transferred photonic crystal devices that have maintained structural integrity and functionality.
机译：我们演示了制造和转移硅纳米膜（Si-NMs）的过程，该过程已从其宿主衬底释放并重新沉积在异质柔性或平坦衬底上。开发出的转移工艺使复杂的光子器件可以通过NM转移到各种新的基板材料上。这使得转移的器件受益于衬底和NM的材料特性。我们的工艺旨在转移和堆叠大面积光子器件，而不会影响其光学性能。该工艺已用于转移面积超过2.5 cm〜（2）的大面积无图案硅NM，以及具有复杂器件设计且包含各种填充因子的光子器件。我们还展示了保持结构完整性和功能性的转移光子晶体器件。

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