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Plasmonic band gap engineering of plasmon-exciton coupling

机译:等离子体激子耦合的等离子带隙工程

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Controlling plasmon-exciton coupling through band gap engineering of plasmonic crystals is demonstrated in the Kretschmann configuration. When the flat metal surface is textured with a sinusoidal grating only in one direction, using laser interference lithography, it exhibits a plasmonic band gap because of the Bragg scattering of surface plasmon polaritons on the plasmonic crystals. The contrast of the grating profile determines the observed width of the plasmonic band gap and hence allows engineering of the plasmonic band gap. In this work, resonant coupling between the molecular resonance of a J-aggregate dye and the plasmonic resonance of a textured metal film is extensively studied through plasmonic band gap engineering. Polarization dependent spectroscopic reflection measurements probe the spectral overlap occurring between the molecular resonance and the plasmonic resonance. The results indicate that plasmon-exciton interaction is attenuated in the band gap region along the grating direction.
机译:通过等离激元晶体的带隙工程控制等离激元-激子耦合已在Kretschmann配置中得到证明。当使用激光干涉光刻在平坦的金属表面仅在一个方向上使用正弦光栅进行纹理化时,由于表面等离激元极化子在等离激子晶体上的布拉格散射,因此它会显示出等离子带隙。光栅轮廓的对比度决定了所观察到的等离子带隙的宽度,因此可以对等离子带隙进行工程设计。在这项工作中,J-聚集染料的分子共振与带纹理的金属膜的等离子体共振之间的共振耦合通过等离子体带隙工程被广泛研究。偏振相关的光谱反射测量可探测分子共振和等离子体共振之间发生的光谱重叠。结果表明,沿着光栅方向,在带隙区域中等离子体激子相互作用被减弱。

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