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首页> 外文期刊>Physical chemistry chemical physics: PCCP >Promising electrochemical hydrogen storage properties of thick Mg-Pd films obtained by insertion of thin Ti interlayers
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Promising electrochemical hydrogen storage properties of thick Mg-Pd films obtained by insertion of thin Ti interlayers

机译：通过插入薄的Ti中间层获得的厚Mg-Pd膜的有希望的电化学储氢性能

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摘要

In this paper, the structures of 500 nm thick Mg-Pd films were tailored by insertion of 1 nm thin Ti interlayers, and their electrochemical hydrogen storage properties were investigated. Results showed that thin Ti interlayers in the Mg bulk film could significantly improve the discharge properties of thick Mg-Pd films. The Mg100-Ti1 sample exhibited the most promising electrochemical properties, including a shorter activation period, larger discharge capacity, superior cyclic stability and high rate discharge capability, due to the creation of numerous interfaces and nucleation sites, reduction of the hydrogen diffusion path, and synergetic catalytic effects of Pd and Ti layers.
机译：本文通过插入1 nm薄的Ti中间层来定制500 nm厚的Mg-Pd膜的结构，并研究了其电化学储氢性能。结果表明，Mg体膜中的薄Ti中间层可以显着改善Mg-Pd厚膜的放电性能。 Mg100-Ti1样品表现出最有希望的电化学性能，包括较短的活化时间，较大的放电容量，优异的循环稳定性和高速率放电容量，这归因于形成了许多界面和成核位点，减少了氢的扩散路径以及钯和钛层的协同催化作用。

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