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首页> 外文期刊>Physica, B. Condensed Matter >Low-energy muon [LEM] study of Zn-phthalocyanine and ZnO thin films
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Low-energy muon [LEM] study of Zn-phthalocyanine and ZnO thin films

机译:Zn-酞菁和ZnO薄膜的低能μon[LEM]研究

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摘要

Implantation of low-energy muons; in zinc-phthalocyanine (ZnPc) thin-films leads to the formation of muoniated radical states, the fast decaying of the mu SR signal at low fields being a clear indication of muonium formation. The formation probability of these paramagnetic states is independent of the implantation depth and amounts, as in the bulk, to approximately 100% of all muons. In these molecular crystals the formation of muonium is a highly local effect and is fairly independent of crystalline structure and defects in the sample. In contrast to that, in vapour-grown ZnO films the paramagnetic signal known from bulk experiments is not observed, even for the deeper implantations. We suggest that in this case muonium is not formed due to the low concentration of free electrons. In these strongly distorted films, electrons are captured at defects and are not available for muonium formation.
机译:植入低能μ子;锌-酞菁(ZnPc)薄膜中的Ms导致形成多价基团,低电场下mu SR信号的快速衰减清楚地表明了formation的形成。这些顺磁态的形成概率与注入深度无关,并且与整体上的注入量无关,约为全部μ子的100%。在这些分子晶体中,mu的形成是高度局部的,并且与晶体结构和样品中的缺陷完全无关。与此相反,在气相生长的ZnO薄膜中,即使对于更深的注入,也未观察到大量实验所知的顺磁信号。我们建议在这种情况下,由于自由电子的浓度较低,因此不会形成mu。在这些严重变形的薄膜中,电子被捕获在缺陷处,不可用于形成mu。

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