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首页> 外文期刊>Physica, B. Condensed Matter >Effects of argon pressure on magnetic properties and low-field magnetostriction of amorphous TbFe films
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Effects of argon pressure on magnetic properties and low-field magnetostriction of amorphous TbFe films

机译：氩气压力对非晶态TbFe薄膜磁性能和低场磁致伸缩的影响

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摘要

Amorphous TbFe films were fabricated by DC magnetron sputtering, and the effects of argon pressures on the microstructure, magnetic properties and the low magnetic field magnetostrictions of the samples were explored. It is found that with the increase of argon pressure, the surface smoothness and the compactness of TbFe films are declined. At lower argon pressure, maze magnetic domains exist, and it possesses, hence, stronger perpendicular anisotropy. With the increase in argon pressure, the domain walls become gradually wider and the contrast of domain image appears to be less sharper. It implies that the magnetic anisotropy direction of the films gradually changes from perpendicular to parallel to the film plane with larger argon pressure. In addition, the magnetization is stronger with increase in argon pressure, and reaches its maximum value at 0.6 Pa. After that, the magnetization begins to decrease with further increase in argon pressure. However, the coercivity of the films decreases monotonically with the increase in the argon pressure. At low magnetic fields, the magnetostriction of amorphous TbFe films becomes larger with increase in the argon pressure. After reaching its maximum value at 0.6 Pa, a decrease was observed with further increase in argon pressure.
机译：用直流磁控溅射法制备了非晶态的TbFe薄膜，探讨了氩气压力对样品组织，磁性能和低磁场磁致伸缩的影响。发现随着氩气压力的增加，TbFe膜的表面光滑度和致密性下降。在较低的氩气压力下，存在迷宫磁畴，因此它具有较强的垂直各向异性。随着氩气压力的增加，畴壁逐渐变宽，并且畴图像的对比度似乎较不清晰。这意味着在较大的氩气压力下，薄膜的磁各向异性方向从垂直于平行于薄膜平面逐渐变化。另外，磁化强度随着氩气压力的增加而增强，并在0.6 Pa达到最大值。此后，随着氩气压力的进一步增加，磁化强度开始下降。但是，随着氩气压力的增加，薄膜的矫顽力单调降低。在低磁场下，非晶态TbFe膜的磁致伸缩随氩气压力的升高而变大。在达到0.6 Pa的最大值后，随着氩气压力的进一步升高，观察到了降低。

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