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首页> 外文期刊>Physica, B. Condensed Matter >An optical study of vacuum evaporated Se85-xTe15Bix chalcogenide thin films
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An optical study of vacuum evaporated Se85-xTe15Bix chalcogenide thin films

机译：真空蒸发Se85-xTe15Bix硫族化物薄膜的光学研究

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摘要

Thin films of Se85-xTe15Bix (x = 0, 1, 2, 3, 4, 5) glassy alloys prepared by melt quenching technique, are deposited on glass substrate using thermal evaporation technique under vacuum. The analysis of transmission spectra, measured at normal incidence, in the spectral range 400-1500 nm helphelps us in the optical characterization of thin films under study. Well-known Swanepoel's method is employed to determine the refractive index (n) and film thickness (d). The increase in n with increasing Bi content over the entire spectral range is related to the increased polarizability of the larger Bi atom (atomic radius 146 angstrom) compared with the Se atom (atomic radius 1.16 angstrom). Dispersion energy (E-d), average energy gap (E-0) and static refractive index (n(0)) isare calculated using Wemple-DiDomenico model (WDD). The value of absorption coefficient (alpha) and hence extinction coefficient (k) hashave been determined from transmission spectra. Optical band gap (E-g) is estimated using Tauc's extrapolation and is found to decrease from 1.46 to 1.24 eV with the Bi addition. This behavior of optical band gap is interpreted in terms of electronegativity difference of the atoms involved and cohesive energy of the system.
机译：通过真空淬火技术将通过熔融淬火技术制备的Se85-xTe15Bix（x = 0、1、2、3、4、5）玻璃态合金薄膜沉积在玻璃基板上。在法线入射下测量的400-1500 nm光谱范围内的透射光谱的分析有助于我们研究薄膜的光学特性。使用众所周知的Swanepoel方法确定折射率（n）和膜厚度（d）。在整个光谱范围内，随着Bi含量的增加，n的增加与更大的Bi原子（原子半径146埃）相比于Se原子（原子半径1.16埃）的极化率提高有关。使用Wemple-DiDomenico模型（WDD）计算分散能（E-d），平均能隙（E-0）和静态折射率（n（0））。由透射光谱确定吸收系数α的值并因此确定消光系数（k）哈希值。光学带隙（E-g）使用Tauc外推法估算，发现通过添加Bi可以将其从1.46 eV降低至1.24 eV。光学带隙的这种行为是根据所涉及原子的电负性差异和系统的内聚能来解释的。

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