首页> 外文期刊>The journal of physical chemistry, A. Molecules, spectroscopy, kinetics, environment, & general theory >Chemical Reaction Studies in CH_4/Ar and CH_4/N_2 Gas Mixtures of a Dielectric Barrier Discharge
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Chemical Reaction Studies in CH_4/Ar and CH_4/N_2 Gas Mixtures of a Dielectric Barrier Discharge

机译:介质阻挡放电的CH_4 / Ar和CH_4 / N_2气体混合物中的化学反应研究

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摘要

Chemical reactions in a dielectric barrier discharge at medium pressure of 250-300 mbar have been studied in CH_4/Ar and CH_4/N_2 gas mixtures by means of mass spectrometry.The main reaction scheme is production of H_2 by fragmentation of CH_4,but also production of higher order hydrocarbon molecules such as C_nH_m with n up to 9 including formation of different functional CN groups is observed.Formation of C_2H_2,C_2H_4,and C_2H_6 molecules has been investigated in some detail.Significant differences are noted in comparison to a theoretical estimate.
机译:通过质谱研究了CH_4 / Ar和CH_4 / N_2混合气体在250-300 mbar中压下介质阻挡放电中的化学反应。主要反应方案是通过CH_4的裂解生成H_2,但也有生产观察到n个多达9个的高阶碳氢化合物分子(例如C_nH_m)包括不同官能团的CN形成。已对C_2H_2,C_2H_4和C_2H_6分子的形成进行了详细研究,与理论估计值相比存在明显差异。

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